Surface modification of nanoparticles will present great challenges due to their extremely small dimensions, high surface areas, and high surface energies. In this research, we demonstrate the uniform deposition of ultrathin polymer films of 2 nm on the surfaces of alumina nanoparticles. The deposited film can also be tailored to multilayers. Time-of-flight secondary ion mass spectroscopy was used to confirm the pyrrole thin film on the nanoparticle surfaces. Using such a nanocoating, it is possible to alter the intrinsic properties of materials that cannot be achieved by conventional methods and materials. © 2001 American Institute of Physics.Peer Reviewedhttp://deepblue.lib.umich.edu/bitstream/2027.42/70221/2/APPLAB-78-9-1243-1.pd
Atomic layer deposition (ALD) is currently a widespread method to grow conformal thin films with a s...
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Atomic layer deposition (ALD) is currently a widespread method to grow conformal thin films with a s...
Presented work is focused on the deposition and characterization of thin and ultrathin plasma polyme...
The reaction mechanism of area-selective atomic layer deposition (AS-ALD) of Al2O3 thin films using ...
Multi-layer ultrathin polymer films have been deposited on the surfaces of nanoparticles of alumina ...
Ultrathin films of pyrrole were deposited on the surfaces of carbon nanotubes using a plasma polymer...
An innovative process to uniformly incorporate dispersed nano-scale ceramic inclusions within a poly...
We have been developing our capability with atomic layer deposition (ALD), to understand the influen...
Particles are widely used in the chemical industry as raw material and end product. In many applicat...
The goal was to study polymer films and coated paperboard as base substrates for atomic layer deposi...
Thin Al2O3 films were deposited on silicon and poly(2,6 ethylenenaphthalate) (PEN) substrates by mea...
There is strong demands to functionalize nanoparticles for many different industrial and scientific ...
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International audienceWe present here an original safe-by-design method for the elaboration ofnanost...
The effects of thin film nucleation and initial growth on roughness, chemistry and thermomechanical ...
Atomic layer deposition (ALD) is currently a widespread method to grow conformal thin films with a s...
Presented work is focused on the deposition and characterization of thin and ultrathin plasma polyme...
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