A self‐consistent analysis of the quantum‐well emission transistor (QWET) is presented allowing an exact calculation of the device quantum properties. Poisson’s and Schrödinger’s equation are solved numerically using a finite‐difference method on a self‐consistent basis. Pseudomorphic AlGaAs/InGaAs designs with 15%–20% excess In are suggested for improving the device performance. Design with doping in various parts of the QWET are also studied. This analysis reveals that the device performance is less optimistic than previously predicted by analytic approaches. By introducing the pseudomorphic channel principle, while maintaining a reasonably low Al content for the gate and collector layers, it is, however, possible to obtain satisfactory p...
Because of technological advancement, transistor dimensions are approaching the length scale of the ...
This paper covers the fundamentals of SDGFETs and ADGFETs. Drain modern fashions for unmarried gate ...
Channel length of metal oxide semiconductor field effect transistors (MOSFETs) are scaling below 20 ...
A Monte Carlo simulation of double‐quantum‐well (DQW) devices is presented in view of analyzing the ...
The semiconductor industry, in its continued effort to scale down nanoscale components further, need...
This thesis describes advanced modeling of nanoscale bulk MOSFETs incorporating critical quantum mec...
Thesis: Ph. D., Massachusetts Institute of Technology, Department of Electrical Engineering and Comp...
InAs quantum well field effect transistors (QWFETs) is presented and used to provide design guidelin...
According to Moores’s Law, the number of transistors per square inch on integrated circuits are doub...
[[abstract]]Three HEMT (high-electron-mobility transistor) structures, the single-heterostructure HE...
We have investigated the dc characteristics of InGaAs/AlGaAs modulation doped field effect transisto...
SIGLEAvailable from British Library Document Supply Centre- DSC:DX97532 / BLDSC - British Library Do...
Numerical simulation in the field of semiconductor device development advanced to a valuable, cost-e...
QCA technology is a possible substitution for semiconductor-based technology. This paper presents a ...
The scaling of the metal-oxide-semiconductor field-effect transistor (MOSFET) has been the driving f...
Because of technological advancement, transistor dimensions are approaching the length scale of the ...
This paper covers the fundamentals of SDGFETs and ADGFETs. Drain modern fashions for unmarried gate ...
Channel length of metal oxide semiconductor field effect transistors (MOSFETs) are scaling below 20 ...
A Monte Carlo simulation of double‐quantum‐well (DQW) devices is presented in view of analyzing the ...
The semiconductor industry, in its continued effort to scale down nanoscale components further, need...
This thesis describes advanced modeling of nanoscale bulk MOSFETs incorporating critical quantum mec...
Thesis: Ph. D., Massachusetts Institute of Technology, Department of Electrical Engineering and Comp...
InAs quantum well field effect transistors (QWFETs) is presented and used to provide design guidelin...
According to Moores’s Law, the number of transistors per square inch on integrated circuits are doub...
[[abstract]]Three HEMT (high-electron-mobility transistor) structures, the single-heterostructure HE...
We have investigated the dc characteristics of InGaAs/AlGaAs modulation doped field effect transisto...
SIGLEAvailable from British Library Document Supply Centre- DSC:DX97532 / BLDSC - British Library Do...
Numerical simulation in the field of semiconductor device development advanced to a valuable, cost-e...
QCA technology is a possible substitution for semiconductor-based technology. This paper presents a ...
The scaling of the metal-oxide-semiconductor field-effect transistor (MOSFET) has been the driving f...
Because of technological advancement, transistor dimensions are approaching the length scale of the ...
This paper covers the fundamentals of SDGFETs and ADGFETs. Drain modern fashions for unmarried gate ...
Channel length of metal oxide semiconductor field effect transistors (MOSFETs) are scaling below 20 ...