We have studied the blue shift in photoluminescence emission energy of pseudomorphic InGaAs/GaAs quantum wells grown on patterned (001) GaAs substrates with grooves and trenches having vertical sidewalls made by dry etching. Dependence of the blue shift, which can be as large as 51 meV, on the direction, feature size, and the etch depth of the patterns as well as the thickness of the buffer layer was observed, and is explained by the altered migration behavior of the adatoms. © 1996 American Institute of Physics.Peer Reviewedhttp://deepblue.lib.umich.edu/bitstream/2027.42/69735/2/APPLAB-68-8-1120-1.pd
This letter reports the successful molecular beam epitaxial growth of high‐quality InxGa1−xAs/InxAl1...
In Al0.3Ga0.7As/GaAs quantum wells bordered by ultrathin (one or two monolayers) AlAs layers, the Al...
Reflection high‐energy electron diffraction oscillations have been studied during the growth of stra...
In this thesis growth on patterned substrates has been studied for the lateral bandgap control of th...
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer...
The photoluminescence (PL) technique as a function of temperature and excitation intensity was used ...
The growth of ridge structures on GaAs(OOl) patterned substrates has been investigated using Atomic ...
We investigated the optical properties of lattice-matched InGaAs/InP quantum wells grown by metalorg...
We have used photoluminescence spectroscopy to investigate the influence of interface roughness in G...
The temperature dependence of the optical properties of InGaAs/GaAs double quantum wells (QWs) grown...
The selectivity of growth on patterned GaAs (311)A substrates qualitatively differs from that on low...
The causes were investigated for the photoluminescence red-shift with increasing quantum well growth...
We report on the evolution of the growth front during molecular-beam epitaxy on GaAs (3 1 1)A substr...
With conventional photolithography and wet chemical etching, we have realized GaAs/AlGaAs buried rid...
Selective growth of InGaAsquantum dots on GaAs is reported. It is demonstrated that selective-area e...
This letter reports the successful molecular beam epitaxial growth of high‐quality InxGa1−xAs/InxAl1...
In Al0.3Ga0.7As/GaAs quantum wells bordered by ultrathin (one or two monolayers) AlAs layers, the Al...
Reflection high‐energy electron diffraction oscillations have been studied during the growth of stra...
In this thesis growth on patterned substrates has been studied for the lateral bandgap control of th...
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer...
The photoluminescence (PL) technique as a function of temperature and excitation intensity was used ...
The growth of ridge structures on GaAs(OOl) patterned substrates has been investigated using Atomic ...
We investigated the optical properties of lattice-matched InGaAs/InP quantum wells grown by metalorg...
We have used photoluminescence spectroscopy to investigate the influence of interface roughness in G...
The temperature dependence of the optical properties of InGaAs/GaAs double quantum wells (QWs) grown...
The selectivity of growth on patterned GaAs (311)A substrates qualitatively differs from that on low...
The causes were investigated for the photoluminescence red-shift with increasing quantum well growth...
We report on the evolution of the growth front during molecular-beam epitaxy on GaAs (3 1 1)A substr...
With conventional photolithography and wet chemical etching, we have realized GaAs/AlGaAs buried rid...
Selective growth of InGaAsquantum dots on GaAs is reported. It is demonstrated that selective-area e...
This letter reports the successful molecular beam epitaxial growth of high‐quality InxGa1−xAs/InxAl1...
In Al0.3Ga0.7As/GaAs quantum wells bordered by ultrathin (one or two monolayers) AlAs layers, the Al...
Reflection high‐energy electron diffraction oscillations have been studied during the growth of stra...