Optical and electrical properties of ITO thin films sputtered on flexible FEP substrate as passive thermal control system for space applications

ITO thin films were deposited on flexible fluorinated ethylene propylene (FEP) substrates by pulsed direct current reactive magnetron sputtering system using an In:Sn (90-10 %wt) alloy target. The influence of the deposition parameters (argon and oxygen flow rates, and substrate temperature) and effect of coating thickness on the optical, electrical, structural and microstructural properties of ITO thin films deposited on FEP was investigated. The thickness of the ITO coatings was varied from 10 to 180 nm. The optimized ITO coating (10 nm thick) exhibited high IR emittance (79%) on FEP substrate with high average solar transmittance (94%) and moderate sheet resistance (3 kΩ/sq.). We also investigated in detail the angular dependence of reflectance as well as haze factor of thin ITO coatings. Our results suggest that 10 nm thick ITO coating exhibits an average haze factor of 8.6%. The high value of IR emittance, moderate sheet resistance and high solar transmittance along with low haze factor indicate the suitability of ITO thin films on FEP substrates as flexible optical solar reflector for space applications