Interfacing of ferroelectric and semiconductor materials provides a means of coupling unique properties associated with ferroelectric materials to high performance semiconductor devices. In this work we report the electronic properties of ferroelectric/ZnO heterostructures, where (Pb,Zr)TiO3 (PZT) is used as a prototypical ferroelectric oxide. Metal–PZT–metal structures demonstrate ferroelectric hysteresis with remanent polarization of 28 µC cm−2 and coercive field of 75 kV cm−1 for a loop of 15 V. The metal–PZT–ZnO capacitor structures demonstrate a characteristic metal–insulator–semiconductor capacitance–voltage (C–V) behaviour with a hysteretic memory window of approximately 4 V. The heterostructure C–V characteristics do not change sign...
Just Accepted ManuscriptIn the present work, we study the hysteretic behavior in the electric-field-...
[[abstract]]Metal-ferroelectric-insulator-semiconductor capacitors with Pb(Zr0.53,Ti0.47)O3 (PZT) fe...
This work reports the effect of partial oxygen pressure, used in the deposition of the ZnO layer, on...
We report on capacitance-voltage, current-voltage, Sawyer–Tower, and transient current switching mea...
We present a dielectric continuum model approach for studying the electrical polarization properties...
Heterostructures composed of polar materials, such as ferroelectric and/or piezoelectric, are intere...
Asymmetric metal–ferroelectric–metal (MFM) structures were manufactured by sol–gel deposition of a l...
Ferroelectric/semiconductor heterostructures are desirable for multifunctional devices using the ch...
We report on temperature, time, and voltage dependent resistive hysteresis measurements of BaTiO3-Zn...
In the context of miniaturization of devices, ferroelectric materials are used as multifunctional ma...
Applications of ferroelectric materials in modern microelectronics will be greatly encouraged if the...
Piezoresponse force microscopy (PFM) technique has been utilized to study the evolution of domain st...
Recently, significant progress has been made in integrating ferroelectric materials and semiconducto...
We report on ferroelectric field effect experiments in epitaxial oxide heterostructures consisting o...
With the intensive use of modern microelectronic devices in numerous areas, there is an increasing d...
Just Accepted ManuscriptIn the present work, we study the hysteretic behavior in the electric-field-...
[[abstract]]Metal-ferroelectric-insulator-semiconductor capacitors with Pb(Zr0.53,Ti0.47)O3 (PZT) fe...
This work reports the effect of partial oxygen pressure, used in the deposition of the ZnO layer, on...
We report on capacitance-voltage, current-voltage, Sawyer–Tower, and transient current switching mea...
We present a dielectric continuum model approach for studying the electrical polarization properties...
Heterostructures composed of polar materials, such as ferroelectric and/or piezoelectric, are intere...
Asymmetric metal–ferroelectric–metal (MFM) structures were manufactured by sol–gel deposition of a l...
Ferroelectric/semiconductor heterostructures are desirable for multifunctional devices using the ch...
We report on temperature, time, and voltage dependent resistive hysteresis measurements of BaTiO3-Zn...
In the context of miniaturization of devices, ferroelectric materials are used as multifunctional ma...
Applications of ferroelectric materials in modern microelectronics will be greatly encouraged if the...
Piezoresponse force microscopy (PFM) technique has been utilized to study the evolution of domain st...
Recently, significant progress has been made in integrating ferroelectric materials and semiconducto...
We report on ferroelectric field effect experiments in epitaxial oxide heterostructures consisting o...
With the intensive use of modern microelectronic devices in numerous areas, there is an increasing d...
Just Accepted ManuscriptIn the present work, we study the hysteretic behavior in the electric-field-...
[[abstract]]Metal-ferroelectric-insulator-semiconductor capacitors with Pb(Zr0.53,Ti0.47)O3 (PZT) fe...
This work reports the effect of partial oxygen pressure, used in the deposition of the ZnO layer, on...