peer reviewedAlGaN/GaN Round-HEMTs on silicon substrates have been realised and their static characteristics investigated. The AlGaN/GaN (x = 0.23) material structures were grown on (111) p-Si by LP-MOVPE. Devices with 0.3 mm gate length exhibit a saturation current of 0.82 A/mm, a good pinch-off and a peak extrinsic transconductance of 110 mS/mm. Highest saturation current reported so far and static output characteristics up to 20 V demonstrate that the devices are capable of handling 16 W/mm of static heat dissipation without any degradation of their performance
The task of this work was to fabricate and characterize AlGaN/GaN HEMTs on sapphire and silicon subs...
This Letter reports on the epitaxial growth, characterization, and device characteristics of crack-f...
In this paper, the development of a novel manufacturing process is presented for fabricating high-q...
peer reviewedAlGaN/GaN Round-HEMTs on silicon substrates have been realised and their static charact...
AlGaN/GaN Round-HEMTs on silicon substrates have been realised and their static characteristics inve...
AlGaN/GaN HEMTs on silicon substrates have been fabricated and their static and small-signal RF char...
AlGaN/GaN HEMTs on silicon substrates have been fabricated and their static and small-signal RF char...
AlGaN/GaN HEMTs on silicon substrates have been fabricated and their static and small-signal RF char...
In the current work the performance of AlGaN/GaN HEMTs fabricated on silicon substrates is presented...
peer reviewedAlGaN/GaN HEMTs on silicon substrates have been realised and their static and small sig...
Results on the preparation and properties of AlGaN/GaN HEMTs on silicon substrates are presented and...
In order to analyse and to compare the properties of AlGaN/GaN HEMT on silicon and on sapphire subst...
AlGaN/GaN high electron mobility transistor (HEMT) hetero-structures were grown on the 2-in Si (1 1 ...
The AlGaN/GaN-based high-electron-mobility transistors (HEMTs) are suitable for discrete components ...
GaN buffers were deposited on (111)−oriented silicon (Si) by AIXTRON metal organic vapour phase epit...
The task of this work was to fabricate and characterize AlGaN/GaN HEMTs on sapphire and silicon subs...
This Letter reports on the epitaxial growth, characterization, and device characteristics of crack-f...
In this paper, the development of a novel manufacturing process is presented for fabricating high-q...
peer reviewedAlGaN/GaN Round-HEMTs on silicon substrates have been realised and their static charact...
AlGaN/GaN Round-HEMTs on silicon substrates have been realised and their static characteristics inve...
AlGaN/GaN HEMTs on silicon substrates have been fabricated and their static and small-signal RF char...
AlGaN/GaN HEMTs on silicon substrates have been fabricated and their static and small-signal RF char...
AlGaN/GaN HEMTs on silicon substrates have been fabricated and their static and small-signal RF char...
In the current work the performance of AlGaN/GaN HEMTs fabricated on silicon substrates is presented...
peer reviewedAlGaN/GaN HEMTs on silicon substrates have been realised and their static and small sig...
Results on the preparation and properties of AlGaN/GaN HEMTs on silicon substrates are presented and...
In order to analyse and to compare the properties of AlGaN/GaN HEMT on silicon and on sapphire subst...
AlGaN/GaN high electron mobility transistor (HEMT) hetero-structures were grown on the 2-in Si (1 1 ...
The AlGaN/GaN-based high-electron-mobility transistors (HEMTs) are suitable for discrete components ...
GaN buffers were deposited on (111)−oriented silicon (Si) by AIXTRON metal organic vapour phase epit...
The task of this work was to fabricate and characterize AlGaN/GaN HEMTs on sapphire and silicon subs...
This Letter reports on the epitaxial growth, characterization, and device characteristics of crack-f...
In this paper, the development of a novel manufacturing process is presented for fabricating high-q...