International audienceThe effect of forming gas and vacuum annealing on the concentration of carbon dangling bond (P-bC) centers at 3C- and 4H-SiC/SiO2 interfaces has been studied by electron paramagnetic resonance (EPR) spectroscopy. Our results show efficient passivation at 400 degrees C and depassivation for temperatures above 850 degrees C. A dissociation energy of (4.3 +/- 0.3) eV has been determined for both polytypes. (c) 2006 American Institute of Physics
Thermally induced H incorporation, depth distribution, and loss in SiC and in thermally grown SiO2 f...
International audienceThe effect of thermal treatments in nitric oxide (NO) on the paramagnetic defe...
Thermally induced H incorporation, depth distribution, and loss in SiC and in thermally grown SiO2 f...
International audiencePrevious Electron Paramagnetic Resonance (EPR) studies identified the carbon d...
We have investigated the interface and oxide defects in SiC/SiO2 by electron paramagnetic resonance ...
Abstract:The oxidation related defects in porous n-type 4H-SiC have been studied by electron paramag...
We report the observation of a paramagnetic interface defect in thermally oxidized porous n-type dop...
International audienceThe defects at the 3C-SiC/SiO2 interface have been studied by X-band EPR spect...
This study is focused on characterization of deep energy-level interface traps formed during sodium ...
We describe experimental and theoretical studies to determine the effects of phosphorous as a passiv...
Silicon carbide (SiC) is a wide bandgap semiconductor which has material properties well-suited for ...
We characterized an intrinsic interface defect, called the "PbC center," formed at 4H-SiC(0001)/SiO2...
We study an electron-spin-resonance (ESR) signal of carbon dangling-bond defects at 4H-SiC(0001)/SiO...
AbstractAmorphous hydrogenated silicon carbide (a-SiCx:H) could be used as a passivating layer in so...
The origination of poor quality remains debating at the as-grown SiO2/4H-SiC (0001) interface during...
Thermally induced H incorporation, depth distribution, and loss in SiC and in thermally grown SiO2 f...
International audienceThe effect of thermal treatments in nitric oxide (NO) on the paramagnetic defe...
Thermally induced H incorporation, depth distribution, and loss in SiC and in thermally grown SiO2 f...
International audiencePrevious Electron Paramagnetic Resonance (EPR) studies identified the carbon d...
We have investigated the interface and oxide defects in SiC/SiO2 by electron paramagnetic resonance ...
Abstract:The oxidation related defects in porous n-type 4H-SiC have been studied by electron paramag...
We report the observation of a paramagnetic interface defect in thermally oxidized porous n-type dop...
International audienceThe defects at the 3C-SiC/SiO2 interface have been studied by X-band EPR spect...
This study is focused on characterization of deep energy-level interface traps formed during sodium ...
We describe experimental and theoretical studies to determine the effects of phosphorous as a passiv...
Silicon carbide (SiC) is a wide bandgap semiconductor which has material properties well-suited for ...
We characterized an intrinsic interface defect, called the "PbC center," formed at 4H-SiC(0001)/SiO2...
We study an electron-spin-resonance (ESR) signal of carbon dangling-bond defects at 4H-SiC(0001)/SiO...
AbstractAmorphous hydrogenated silicon carbide (a-SiCx:H) could be used as a passivating layer in so...
The origination of poor quality remains debating at the as-grown SiO2/4H-SiC (0001) interface during...
Thermally induced H incorporation, depth distribution, and loss in SiC and in thermally grown SiO2 f...
International audienceThe effect of thermal treatments in nitric oxide (NO) on the paramagnetic defe...
Thermally induced H incorporation, depth distribution, and loss in SiC and in thermally grown SiO2 f...