International audienceRoom temperature photoreflectance investigations have been performed on a series of AlGaN layers grown both by metalorganic vapor phase epitaxy and molecular beam epitaxy on c-plane sapphire substrates. The aluminum composition was ranging between 0% and 20%, and was determined independently in the different growth laboratories, by various methods. It is found that within the experimental uncertainty, there is no detectable bowing parameter in these alloys. This contradicts some previous experimental investigations and confirms other ones
Abstract: We have investigated the impact of AlN buffer layer growth parameters for developing highl...
An epilayer of wide-band gap AlxGa1-xN was grown on sapphire by metal organic chemical vapor deposit...
ly reflectance monitoring was used to compare the growth dynamics for the different substrates. The ...
Room temperature photoreflectance investigations have been performed on a series of AlGaN layers gro...
The band gap of AlXGal.XN is measured for the composition range 0s<0.45; the resulting bowing parame...
The normal-incidence reflectance measurement was employed to obtain the free exciton transition ener...
International audienceA detailed discussion of the optical properties of Al-rich Al 1−x In x N alloy...
An AlGaN layer with good crystalline quality (chi(min)=2.1%) was grown by metalorganic vapor phase e...
The strain state of 570nm AlXGa1-xN layers grown on 600nm GaN template by metal organic chemical vap...
Molecular-beam epitaxy grown AlxGa1−xN alloys covering the entire range of alloy compositions, 0⩽x⩽1...
[[abstract]]The band-gap energy and band-gap bowing parameter of the wurtzite AlGaN alloys are inves...
We have studied the influence of III/N flux ratio and growth temperature on structural and optical p...
[[abstract]]The material properties of zincblende AlxGa1-xN alloys from first-principles calculation...
The influence of low-temperature AlN buffer layer thickness on GaN epilayer was investigated by trip...
Contains fulltext : 32845.pdf (publisher's version ) (Open Access
Abstract: We have investigated the impact of AlN buffer layer growth parameters for developing highl...
An epilayer of wide-band gap AlxGa1-xN was grown on sapphire by metal organic chemical vapor deposit...
ly reflectance monitoring was used to compare the growth dynamics for the different substrates. The ...
Room temperature photoreflectance investigations have been performed on a series of AlGaN layers gro...
The band gap of AlXGal.XN is measured for the composition range 0s<0.45; the resulting bowing parame...
The normal-incidence reflectance measurement was employed to obtain the free exciton transition ener...
International audienceA detailed discussion of the optical properties of Al-rich Al 1−x In x N alloy...
An AlGaN layer with good crystalline quality (chi(min)=2.1%) was grown by metalorganic vapor phase e...
The strain state of 570nm AlXGa1-xN layers grown on 600nm GaN template by metal organic chemical vap...
Molecular-beam epitaxy grown AlxGa1−xN alloys covering the entire range of alloy compositions, 0⩽x⩽1...
[[abstract]]The band-gap energy and band-gap bowing parameter of the wurtzite AlGaN alloys are inves...
We have studied the influence of III/N flux ratio and growth temperature on structural and optical p...
[[abstract]]The material properties of zincblende AlxGa1-xN alloys from first-principles calculation...
The influence of low-temperature AlN buffer layer thickness on GaN epilayer was investigated by trip...
Contains fulltext : 32845.pdf (publisher's version ) (Open Access
Abstract: We have investigated the impact of AlN buffer layer growth parameters for developing highl...
An epilayer of wide-band gap AlxGa1-xN was grown on sapphire by metal organic chemical vapor deposit...
ly reflectance monitoring was used to compare the growth dynamics for the different substrates. The ...