Flexible photovoltaic films have been recently shown to have efficiencies comparable to those of solid Si based photovoltaics. Flexible PV films have significant advantages in terms of ease of manufacture by roll-to-roll (R2R) techniques and in easy building integration. A significant challenge is the protection of the flexible solar cells from water vapour ingress, which seriously reduces cell life and efficiency. Transparent barrier films are a possible solution to addressing the water vapour transmission rate (WVTR) challenge. Consequently thin barrier films such as those made from Al2O3 are the subject of increasing research interest when used for the encapsulation of flexible PV modules. The film can be produced by several thin film de...
The relationship between surface morphology, defects density and water vapor permeability of alumini...
This paper reports on the recent work carried out as part of the EU funded NanoMend project. The pro...
The atomic layer deposition technique (ALD) is used to apply a thin (40-100 nm thick) barrier coat...
Transparent barrier films such as Al2O3 used for prevention of oxygen and/or water vapour permeation...
AbstractTransparent barrier films such as Al2O3 used for prevention of oxygen and/or water vapour pe...
Flexible thin-film photovoltaic (PV) modules based on copper indium gallium selenide (CIGS) material...
This paper reports on the recent work carried out as part of the EU funded NanoMend project. The pro...
Thin functional barrier layers of aluminum oxide (Al2O3) that are used particularly in photovoltaic ...
This paper details findings from recent work undertaken as part of the EU funded NanoMend project. ...
To the present day, there is still an increasing interest in the development of Cu (In, Ga) Se2 (CIG...
This paper reports on the recent work carried out as part of the EU funded research and development ...
This paper reports on the progress of the NanoCleaR project, which began in Januaray of 2012. With f...
This paper reports on the recent work carried out as part of the initial stages of the EU funded Nan...
The development of optical on-line/in-process surface inspection and characterisation systems for fl...
Roll to Roll manufacture of nano-scale thinf ilm layers faces the challenge of micro/nano-scale defe...
The relationship between surface morphology, defects density and water vapor permeability of alumini...
This paper reports on the recent work carried out as part of the EU funded NanoMend project. The pro...
The atomic layer deposition technique (ALD) is used to apply a thin (40-100 nm thick) barrier coat...
Transparent barrier films such as Al2O3 used for prevention of oxygen and/or water vapour permeation...
AbstractTransparent barrier films such as Al2O3 used for prevention of oxygen and/or water vapour pe...
Flexible thin-film photovoltaic (PV) modules based on copper indium gallium selenide (CIGS) material...
This paper reports on the recent work carried out as part of the EU funded NanoMend project. The pro...
Thin functional barrier layers of aluminum oxide (Al2O3) that are used particularly in photovoltaic ...
This paper details findings from recent work undertaken as part of the EU funded NanoMend project. ...
To the present day, there is still an increasing interest in the development of Cu (In, Ga) Se2 (CIG...
This paper reports on the recent work carried out as part of the EU funded research and development ...
This paper reports on the progress of the NanoCleaR project, which began in Januaray of 2012. With f...
This paper reports on the recent work carried out as part of the initial stages of the EU funded Nan...
The development of optical on-line/in-process surface inspection and characterisation systems for fl...
Roll to Roll manufacture of nano-scale thinf ilm layers faces the challenge of micro/nano-scale defe...
The relationship between surface morphology, defects density and water vapor permeability of alumini...
This paper reports on the recent work carried out as part of the EU funded NanoMend project. The pro...
The atomic layer deposition technique (ALD) is used to apply a thin (40-100 nm thick) barrier coat...