In this paper a transport equation (TE) is derived that matches closely (within the limitation of an infinite target) the transport model in the Monte Carlo code TRIM. Initially, the authors derive a TE that incorporates an arbitrary free-flight path length distribution function and a stopping energy. From this TE a coupled set of integral equations (for spatial moments up to order four) incorporating the liquid free-flight path model used in TRIM is derived. Also, for the gas-like model of the free-flight path length distribution, the equivalence is shown between the new TE and the LSS backward linearized Boltzmann equation extended by Brice to include an intermediate energy
In a previous paper a revised version of the Projected Range ALgorithm (PRAL) was presented. These n...
A null collision Monte Carlo method is proposed to calculate the transport kinetics of charged parti...
This paper outlines a novel analytical model for the two-dimensional description of ion implantation...
In this paper a transport equation (TE) is derived that matches closely (within the limitation of an...
This is the second of two papers concerned with fitting Pearson curves to Monte Carlo simulations of...
In this, the first of two papers, the problem of constructing ion implantation profiles in one and t...
Commencing with the LSS integro-differential equation, an approximate transport equation is derived ...
In this paper, a new analytical model for the description of lateral spread of implanted ions is com...
Ion implantation is the most important doping technique for VLSI circuits. In this contribution, mod...
The Boltzmann transport equation (BTE) is the governing equation for nonequilibrium particle transp...
ABSTRACT: We present a two-dimensional model of ion implantation which accounts for position depende...
Ion energy straggling is accomodated in condensed history (CH) Monte Carlo simulation by sampling en...
SIGLEAvailable from British Library Document Supply Centre- DSC:4672.262(JET-P--87/61) / BLDSC - Bri...
The 400 keV Nd ions were implanted into Si at a variety of tilt angles from 7 degrees to 75 degrees....
The velocity distribution function and transport coefficients for charged particles in weakly ionize...
In a previous paper a revised version of the Projected Range ALgorithm (PRAL) was presented. These n...
A null collision Monte Carlo method is proposed to calculate the transport kinetics of charged parti...
This paper outlines a novel analytical model for the two-dimensional description of ion implantation...
In this paper a transport equation (TE) is derived that matches closely (within the limitation of an...
This is the second of two papers concerned with fitting Pearson curves to Monte Carlo simulations of...
In this, the first of two papers, the problem of constructing ion implantation profiles in one and t...
Commencing with the LSS integro-differential equation, an approximate transport equation is derived ...
In this paper, a new analytical model for the description of lateral spread of implanted ions is com...
Ion implantation is the most important doping technique for VLSI circuits. In this contribution, mod...
The Boltzmann transport equation (BTE) is the governing equation for nonequilibrium particle transp...
ABSTRACT: We present a two-dimensional model of ion implantation which accounts for position depende...
Ion energy straggling is accomodated in condensed history (CH) Monte Carlo simulation by sampling en...
SIGLEAvailable from British Library Document Supply Centre- DSC:4672.262(JET-P--87/61) / BLDSC - Bri...
The 400 keV Nd ions were implanted into Si at a variety of tilt angles from 7 degrees to 75 degrees....
The velocity distribution function and transport coefficients for charged particles in weakly ionize...
In a previous paper a revised version of the Projected Range ALgorithm (PRAL) was presented. These n...
A null collision Monte Carlo method is proposed to calculate the transport kinetics of charged parti...
This paper outlines a novel analytical model for the two-dimensional description of ion implantation...