InGaN alloys with (0001) or (000-1) polarities are grown by plasma-assisted molecular beam epitaxy. Scanning tunneling microscopy images, interpreted using first-principles theoretical computations, show that there is a strong indium surface segregation on InGaN for both (0001) and (000-1) polarities. Evidence for the existence and stability of a structure containing two adlayers of indium on the In-rich InGaN(0001) surface is reported. The dependence on growth temperature and group III/V ratio of indium incorporation in InGaN is reported, and a quantitative model based on indium surface segregation is proposed to explain the observed incorporation.</p
InN thin films were grown on Si(1 0 0) substrates by plasma-enhanced atomic layer deposition (PEALD)...
The epitaxial layers of InGaN/GaN MQWs structure were grown on both planar and vicinal sapphire subs...
The surfaces of In- and N-polarity InN grown by molecular-beam epitaxy have been investigated using ...
InGaN alloys with (0001) or (000) polarities are grown by plasma-assisted molecular beam epitaxy. Sc...
Indium incorporation and surface segregation during InGaN growth by molecular beam epitaxy: experime...
The surface structures and growth kinetics of InGaN(0001) are studied. It is well known that during ...
Growth behaviors of InxGa1-xN (x <= 0.2) materials by plasma-assisted molecular beam epitaxy (PA-...
he composition, strain and surface morphology of (0001)InGaN layers are investigated as a function o...
We investigate the structural properties of a series of high alloy content InGaN epilayers grown by ...
International audienceIn this study, InGaN/GaN heterostructures were grown using metal organic vapor...
Indium containing III-Nitride layers are predominantly grown by heteroepitaxy on foreign substrates,...
The incorporation of indium in GaN (0001) surfaces in dependence of strain is investigated by combin...
Transmission electron microscope (TEM) analysis has been carried out for the growth process in thick...
International audienceFirst principle calculations were performed to investigate adsorption and diff...
In this work, GaN/InGaN/GaN nanocolumns (NCs) have been grown by molecular beam epitaxy. Selective a...
InN thin films were grown on Si(1 0 0) substrates by plasma-enhanced atomic layer deposition (PEALD)...
The epitaxial layers of InGaN/GaN MQWs structure were grown on both planar and vicinal sapphire subs...
The surfaces of In- and N-polarity InN grown by molecular-beam epitaxy have been investigated using ...
InGaN alloys with (0001) or (000) polarities are grown by plasma-assisted molecular beam epitaxy. Sc...
Indium incorporation and surface segregation during InGaN growth by molecular beam epitaxy: experime...
The surface structures and growth kinetics of InGaN(0001) are studied. It is well known that during ...
Growth behaviors of InxGa1-xN (x <= 0.2) materials by plasma-assisted molecular beam epitaxy (PA-...
he composition, strain and surface morphology of (0001)InGaN layers are investigated as a function o...
We investigate the structural properties of a series of high alloy content InGaN epilayers grown by ...
International audienceIn this study, InGaN/GaN heterostructures were grown using metal organic vapor...
Indium containing III-Nitride layers are predominantly grown by heteroepitaxy on foreign substrates,...
The incorporation of indium in GaN (0001) surfaces in dependence of strain is investigated by combin...
Transmission electron microscope (TEM) analysis has been carried out for the growth process in thick...
International audienceFirst principle calculations were performed to investigate adsorption and diff...
In this work, GaN/InGaN/GaN nanocolumns (NCs) have been grown by molecular beam epitaxy. Selective a...
InN thin films were grown on Si(1 0 0) substrates by plasma-enhanced atomic layer deposition (PEALD)...
The epitaxial layers of InGaN/GaN MQWs structure were grown on both planar and vicinal sapphire subs...
The surfaces of In- and N-polarity InN grown by molecular-beam epitaxy have been investigated using ...