Add to ORKGThe structure, composition and hardness of reactively sputtered W-B-N thin films were investigated by XRD, EPMA, and Vickers ultramicroindentation.http://www.sciencedirect.com/science/article/B6TVV-4FWNJ1D-3/1/37496577b651c432263f65f0131c7a0
International audienceIn this study, about 400 nm thick BCN films with different compositions were g...
In the present work, coatings in the material systems B-C-W and B-C-Ti have been synthesized by puls...
Thin film technology is of great significance for a variety of products, such as electronics, anti-r...
Tungsten-silicon-nitrogen, W-Si-N, ternary thin films have been reactively sputter deposited from W5...
Tungsten-silicon-nitrogen, W-Si-N, ternary thin films have been reactively sputter deposited from W5...
Tungsten nitride films were deposited by RF reactive magnetron sputtering using Tungsten target. The...
W---Si---N films were deposited by reactive sputtering in a N2+Ar atmosphere from a W target incrust...
SummaryTungsten nitride films were deposited by RF reactive magnetron sputtering using Tungsten targ...
International audienceIn this work, the effect of the addition of increase Ge concentrations to W–N ...
Ternary W-Si-N thin films have been reactively sputter-deposited from a W5Si3 target at different ni...
W-B-C films were deposited on Si(100) substrates held at elevated temperature by reactive sputtering...
The WNx films were deposited by two types of sputtering system: (1) rf magnetron sputtering system, ...
The thin film technology is of great importance in modern society and is a key technology in wide sp...
We present the deposition and characterization of tungsten-tantalum diboride (W,Ta)B2 coatings prepa...
The effect of sputtering pressure on the surface/interface microstructure, crystal phase, mechanical...
International audienceIn this study, about 400 nm thick BCN films with different compositions were g...
In the present work, coatings in the material systems B-C-W and B-C-Ti have been synthesized by puls...
Thin film technology is of great significance for a variety of products, such as electronics, anti-r...
Tungsten-silicon-nitrogen, W-Si-N, ternary thin films have been reactively sputter deposited from W5...
Tungsten-silicon-nitrogen, W-Si-N, ternary thin films have been reactively sputter deposited from W5...
Tungsten nitride films were deposited by RF reactive magnetron sputtering using Tungsten target. The...
W---Si---N films were deposited by reactive sputtering in a N2+Ar atmosphere from a W target incrust...
SummaryTungsten nitride films were deposited by RF reactive magnetron sputtering using Tungsten targ...
International audienceIn this work, the effect of the addition of increase Ge concentrations to W–N ...
Ternary W-Si-N thin films have been reactively sputter-deposited from a W5Si3 target at different ni...
W-B-C films were deposited on Si(100) substrates held at elevated temperature by reactive sputtering...
The WNx films were deposited by two types of sputtering system: (1) rf magnetron sputtering system, ...
The thin film technology is of great importance in modern society and is a key technology in wide sp...
We present the deposition and characterization of tungsten-tantalum diboride (W,Ta)B2 coatings prepa...
The effect of sputtering pressure on the surface/interface microstructure, crystal phase, mechanical...
International audienceIn this study, about 400 nm thick BCN films with different compositions were g...
In the present work, coatings in the material systems B-C-W and B-C-Ti have been synthesized by puls...
Thin film technology is of great significance for a variety of products, such as electronics, anti-r...