Add to ORKGIn this work the oxidation resistance of DC reactive sputtered niobium oxynitrides and its influence on the properties of the films are studied. The depositions have been carried out by DC magnetron sputtering with a reactive gas pulsing process. The nitrogen flow was kept constant and the oxygen flow was pulsed. Pulse durations of 10 s produced multilayer coatings with a period of [lambda] = 10 nm. Three sets of films with increasing duty cycle (= on-time of high oxygen flow / pulse duration) have been deposited. The films were subsequently annealed in air at 400, 500 and 600 °C, respectively.http://www.sciencedirect.com/science/article/B6TVV-4PPW6SP-1/1/3e8113ce7ff05c4c5b2ec8455f6e712
This paper investigates the effect of the reactive gas mixture (N-2 + O-2 + Ar) and oxidation of the...
Reactive pulse magnetron sputtering of a metal target in a reactive gas atmosphere is used for depos...
Zirconium oxynitride thin films were deposited by dc reactive magnetron sputtering. A zirconium meta...
In this work the oxidation resistance of DC reactive sputtered niobium oxynitrides and its influence...
In the present work, we study the oxidation behaviour of NbON multilayer films. The films were depos...
This work seeks an atomistic understanding of fundamental processes in DC reactive magnetron sputter...
International audienceTiOx, TiNy and TiOxNy thin films were deposited by reactive sputtering. The re...
International audienceSilicon oxynitride thin films were sputter deposited by the reactive gas pulsi...
We present a method to eliminate hysteresis effects and to increase the deposition rate for the reac...
Vrstvy na bázi HfB2 jsou známé vysokou tvrdostí, nízkou rezistivitou a oxidační odolností. Díky těmt...
Thin films of titanium oxynitride were successfully prepared by dc reactive magnetron sputtering usi...
In this study, vanadium oxynitride thin films were deposited by reactive magnetron sputtering using ...
An original reactive sputtering method, namely the reactive gas pulsing process (RGPP) was developed...
In this work, the production of RuN thin films using the reactive direct current magnetron sputterin...
Zirconium oxynitrides are excellent candidates for many technological applications, especially decor...
This paper investigates the effect of the reactive gas mixture (N-2 + O-2 + Ar) and oxidation of the...
Reactive pulse magnetron sputtering of a metal target in a reactive gas atmosphere is used for depos...
Zirconium oxynitride thin films were deposited by dc reactive magnetron sputtering. A zirconium meta...
In this work the oxidation resistance of DC reactive sputtered niobium oxynitrides and its influence...
In the present work, we study the oxidation behaviour of NbON multilayer films. The films were depos...
This work seeks an atomistic understanding of fundamental processes in DC reactive magnetron sputter...
International audienceTiOx, TiNy and TiOxNy thin films were deposited by reactive sputtering. The re...
International audienceSilicon oxynitride thin films were sputter deposited by the reactive gas pulsi...
We present a method to eliminate hysteresis effects and to increase the deposition rate for the reac...
Vrstvy na bázi HfB2 jsou známé vysokou tvrdostí, nízkou rezistivitou a oxidační odolností. Díky těmt...
Thin films of titanium oxynitride were successfully prepared by dc reactive magnetron sputtering usi...
In this study, vanadium oxynitride thin films were deposited by reactive magnetron sputtering using ...
An original reactive sputtering method, namely the reactive gas pulsing process (RGPP) was developed...
In this work, the production of RuN thin films using the reactive direct current magnetron sputterin...
Zirconium oxynitrides are excellent candidates for many technological applications, especially decor...
This paper investigates the effect of the reactive gas mixture (N-2 + O-2 + Ar) and oxidation of the...
Reactive pulse magnetron sputtering of a metal target in a reactive gas atmosphere is used for depos...
Zirconium oxynitride thin films were deposited by dc reactive magnetron sputtering. A zirconium meta...