This work is concerned with the design and characterization of deep N-well (DNW) monolithic active pixel sensors (MAPS) fabricated in a vertical integration (3D) CMOS technology. These devices come as an evolution of DNW MAPS fabricated in a planar (2D) CMOS process, whose resolution, detection efficiency and charge collection efficiency are expected to improve as a result of the increased functional density provided by 3D integration technologies. The aim of the paper is to discuss the design guidelines for the front-end electronics and the readout architecture as compared to the case of a 2D CMOS technology and to present the relevant simulation results. Power consumption estimation also shows that the proposed solution has the potentia...
A different approach to the design of CMOS MAPS has recently been proposed. By exploiting the triple...
A 3D, through silicon via microelectronic process, capable of face-to-face assembling two 130 nm CMO...
This work is concerned with the characterization of a large matrix of deep n-well (DNW) 130 nm CMOS ...
This work discusses the main features of a CMOS Deep N-well (DNW) monolithic active pixel sensor (MA...
In the deep n-well (DNW) monolithic active pixel sensor (MAPS) a full in-pixel signal processing cha...
This work presents the characterization of deep n-well (DNW) CMOS monolithic active pixel sensors (M...
This work presents the characterization of deep n-well (DNW) CMOS monolithic active pixel sensors (M...
This work presents the features of a new kind of deep n-well monolithic active pixel sensor (DNW-MA...
Deep N-well (DNW) MAPS have been developed in the last few years with the aim of building monolithic...
This work presents the characterization of Deep N-well (DNW) active pixel sensors fabricated in a ve...
Deep N-well CMOS monolithic active pixel sensors (DNW MAPS) represent an alternative approach to sig...
This paper is intended to discuss the features of a novel kind of monolithic active pixel sensors (M...
Deep N-well CMOS monolithic active pixel sensors (DNW MAPS) represent an alternative approach to sig...
This paper is intended to discuss the features of a novel kind of monolithic active pixel sensors (M...
The prototype of a three-dimensional (3D) monolithic active pixel sensor (MAPS) has been characteriz...
A different approach to the design of CMOS MAPS has recently been proposed. By exploiting the triple...
A 3D, through silicon via microelectronic process, capable of face-to-face assembling two 130 nm CMO...
This work is concerned with the characterization of a large matrix of deep n-well (DNW) 130 nm CMOS ...
This work discusses the main features of a CMOS Deep N-well (DNW) monolithic active pixel sensor (MA...
In the deep n-well (DNW) monolithic active pixel sensor (MAPS) a full in-pixel signal processing cha...
This work presents the characterization of deep n-well (DNW) CMOS monolithic active pixel sensors (M...
This work presents the characterization of deep n-well (DNW) CMOS monolithic active pixel sensors (M...
This work presents the features of a new kind of deep n-well monolithic active pixel sensor (DNW-MA...
Deep N-well (DNW) MAPS have been developed in the last few years with the aim of building monolithic...
This work presents the characterization of Deep N-well (DNW) active pixel sensors fabricated in a ve...
Deep N-well CMOS monolithic active pixel sensors (DNW MAPS) represent an alternative approach to sig...
This paper is intended to discuss the features of a novel kind of monolithic active pixel sensors (M...
Deep N-well CMOS monolithic active pixel sensors (DNW MAPS) represent an alternative approach to sig...
This paper is intended to discuss the features of a novel kind of monolithic active pixel sensors (M...
The prototype of a three-dimensional (3D) monolithic active pixel sensor (MAPS) has been characteriz...
A different approach to the design of CMOS MAPS has recently been proposed. By exploiting the triple...
A 3D, through silicon via microelectronic process, capable of face-to-face assembling two 130 nm CMO...
This work is concerned with the characterization of a large matrix of deep n-well (DNW) 130 nm CMOS ...