This paper is motivated by the growing interest of the detector and readout electronics community towards silicon-on-insulator CMOS processes. Advanced SOI MOSFETs feature peculiar electrical characteristics impacting their performance with respect to bulk CMOS devices. Here we mainly focus on the study of these effects on the noise parameters of the transistors, using experimental data relevant to 180 nm fully depleted SOI devices as a reference. The comparison in terms of white and 1/f noise components with bulk MOSFETs with the same minimum feature size gives a basis of estimate for the signal-to-noise ratio achievable in detector front-end integrated circuits designed in an SOI technology
session C4L-E: Characterization of Advanced DevicesInternational audienceNoise measurements are effi...
International audienceLow frequency noise measurements were performed in n-channel UTBOX transistors...
This paper theoretically revisits the low-frequency noise behavior of the inversion-channel silicon-...
This paper is motivated by the growing interest of the detector and readout electronics community to...
Submicron CMOS technologies provide well-established solutions to the implementation of low noise fr...
Deep sub-micron CMOS technologies provide well established solutions to the implementation of low-no...
An exhaustive study of the high frequency four noise parameters of SOI-MOSFET, as function of variou...
A review of recent results concerning the low frequency noise in modern CMOS devices is given. The a...
An exhaustive experimental study of the high-frequency noise properties of MOSFET in silicon-on-insu...
Submicron CMOS technologies provide well-established solutions to the implementation of low-noise fr...
We have performed low-frequency 1/f noise measurements on thin-film SOI n-MOSFETs up to 250°C using ...
Results are presented of a systematic low-frequency (LF) noise study of deep submicron transistors p...
An exhaustive experimantal study of the high frequency noise properties of MOSFET in Silicon--on--In...
session C4L-E: Characterization of Advanced DevicesInternational audienceNoise measurements are effi...
session C4L-E: Characterization of Advanced DevicesInternational audienceNoise measurements are effi...
session C4L-E: Characterization of Advanced DevicesInternational audienceNoise measurements are effi...
International audienceLow frequency noise measurements were performed in n-channel UTBOX transistors...
This paper theoretically revisits the low-frequency noise behavior of the inversion-channel silicon-...
This paper is motivated by the growing interest of the detector and readout electronics community to...
Submicron CMOS technologies provide well-established solutions to the implementation of low noise fr...
Deep sub-micron CMOS technologies provide well established solutions to the implementation of low-no...
An exhaustive study of the high frequency four noise parameters of SOI-MOSFET, as function of variou...
A review of recent results concerning the low frequency noise in modern CMOS devices is given. The a...
An exhaustive experimental study of the high-frequency noise properties of MOSFET in silicon-on-insu...
Submicron CMOS technologies provide well-established solutions to the implementation of low-noise fr...
We have performed low-frequency 1/f noise measurements on thin-film SOI n-MOSFETs up to 250°C using ...
Results are presented of a systematic low-frequency (LF) noise study of deep submicron transistors p...
An exhaustive experimantal study of the high frequency noise properties of MOSFET in Silicon--on--In...
session C4L-E: Characterization of Advanced DevicesInternational audienceNoise measurements are effi...
session C4L-E: Characterization of Advanced DevicesInternational audienceNoise measurements are effi...
session C4L-E: Characterization of Advanced DevicesInternational audienceNoise measurements are effi...
International audienceLow frequency noise measurements were performed in n-channel UTBOX transistors...
This paper theoretically revisits the low-frequency noise behavior of the inversion-channel silicon-...