Die fortschreitende Skalierung und zunehmende Packungsdichte integrierter Schaltkreise führt zu immer höheren Belastungen der elektronischen Bauelemente. Bei MOS-Transistoren erhöht sich dadurch die Wahrscheinlichkeit eines Gateoxiddurchbruchs. In der vorliegenden Arbeit werden Untersuchungen zum Verhalten von MOS-Transistoren vor und nach einem Gateoxiddurchbruch präsentiert. Dabei werden unterschiedliche Durchbruchsarten klassifiziert und Modelle für die DC-Kennlinien sowie für das Rauschen (Random Telegraph Signals) nach Durchbruch entwickelt. Mit Hilfe der Modelle wird abschließend die Funktion ausgewählter analoger und digitaler Schaltungen analysiert. Es zeigt sich, daß je nach Anwendung und Durchbruchstyp auch nach Durchbruch eines T...
In the modern semiconductor world, there is a significant scaling of the transistor dimensions--The ...
In the modern semiconductor world, there is a significant scaling of the transistor dimensions--The ...
With the continuous scaling of MOSFET devices the gate oxide thickness has decreased drastically in...
La progressivité du claquage des oxydes de grille d'épaisseurs inférieures à 20 nm permet d'envisage...
Ce travail de thèse traite des différents phénomènes de dégradation que peuvent subir les transistor...
One of the most frequent causes of the unstable operation of the MOS components is, besides high tem...
Breakdown (BD) progressivity for oxides thicker than 20nm may allow circuit lifetime extension; for ...
The thesis presents an experimental and theoretical investigation of gate oxide breakdown in MOS net...
Breakdown (BD) progressivity for oxides thicker than 20nm may allow circuit lifetime extension; for ...
The microelectronics industry has invaded our daily lives, particularly in the communication, automo...
The microelectronics industry has invaded our daily lives, particularly in the communication, automo...
The microelectronics industry has invaded our daily lives, particularly in the communication, automo...
The microelectronics industry has invaded our daily lives, particularly in the communication, automo...
Modern CMOS technologies are continuously scaling down. As a result of this, analog designers have s...
With the continuous scaling of MOSFET devices the gate oxide thickness has decreased drastically in...
In the modern semiconductor world, there is a significant scaling of the transistor dimensions--The ...
In the modern semiconductor world, there is a significant scaling of the transistor dimensions--The ...
With the continuous scaling of MOSFET devices the gate oxide thickness has decreased drastically in...
La progressivité du claquage des oxydes de grille d'épaisseurs inférieures à 20 nm permet d'envisage...
Ce travail de thèse traite des différents phénomènes de dégradation que peuvent subir les transistor...
One of the most frequent causes of the unstable operation of the MOS components is, besides high tem...
Breakdown (BD) progressivity for oxides thicker than 20nm may allow circuit lifetime extension; for ...
The thesis presents an experimental and theoretical investigation of gate oxide breakdown in MOS net...
Breakdown (BD) progressivity for oxides thicker than 20nm may allow circuit lifetime extension; for ...
The microelectronics industry has invaded our daily lives, particularly in the communication, automo...
The microelectronics industry has invaded our daily lives, particularly in the communication, automo...
The microelectronics industry has invaded our daily lives, particularly in the communication, automo...
The microelectronics industry has invaded our daily lives, particularly in the communication, automo...
Modern CMOS technologies are continuously scaling down. As a result of this, analog designers have s...
With the continuous scaling of MOSFET devices the gate oxide thickness has decreased drastically in...
In the modern semiconductor world, there is a significant scaling of the transistor dimensions--The ...
In the modern semiconductor world, there is a significant scaling of the transistor dimensions--The ...
With the continuous scaling of MOSFET devices the gate oxide thickness has decreased drastically in...