Investigation of vanadium and nitride alloys thin layers deposited by PVD

Lien vers la version éditeur: http://dx.doi.org/10.1051/epjconf/20122900042In this work we present the technique of magnetron vapor deposition and the effect of several deposition parameters on the structural and morphological properties of prepared thin films. It was noted that the deposition time has an effect on the crystallinity, mechanical properties such as residual stress, roughness surface and the layer composition from target products. Studies were carried out on layers of vanadium (V) and the nitride vanadium (VN)