Erzeugung metallischer Nanostrukturen auf silanisierten, oxidischen Oberflächen durch chemische Elektronenstrahllithographie, Nanopartikelimmobilisierung und stromlose Metallabscheidung

The combination of top-down- and bottom-up-techniques is a promising approach to the fabrication of nanoscaled functional structures, e. g. electrical devices. In this thesis the local reduction of sulfonic acid terminated into thiol terminated silane monolayers on SiO2- and ITO-surfaces via electron irradiation is presented. After exposure the irradiated areas show a different contrast in SEM images indicating a local conversion of the monolayer. The formation of thiol head groups via electron irradiation was proven with X-ray photoelectron spectroscopy by measuring the binding energy of the S2s orbital. Afterwards these thiol patterns were used to selectively immobilise 16nm AuNP from solution through formation of covalent Au-S-bonds. Aside from single circular structures with diameters of approx. 100nm the fabrication of ring-like and linear structures was also possible. In addition to the decoration of solid silicon wafers it was possible to generate patterns of AuNPs on-top of 40nm thick SiO2-membranes. These patterns could be visualised in scanning transmission electron microscopy. Furthermore, the process was also adapted to flexible ITO-covered PET-foils. The formation of electrical conducting structures was achieved by electro-less plating of the generated AuNP patterns with gold enhancement solution. Thereby, resistivities in the range of 4*10^-7 Ohm*m and 3*10^-6 Ohm*m were determined. These values are in accordance to known literature values. By incubation of irradiated monolayers with 6nm AuNP patterns of smaller nanoparticles were generated. Due to the detection of periodic super structures the general feasibility of the fabrication of single particle patterns was shown. In order to generate a large area pattern of single particles designs of individual exposuring spots were used for structuring. After incubation with 6nm AuNP a pattern of mostly single particles and pairs of particles with high periodicity could be fabricated. Thereby, the huge potential of fabricating single particle patterns by self-assembly on EBL-structured monolayers was shown