This thesis is dedicated to the scanning tunneling microscopical investigation of the influence of strain and relaxation on the epitaxial growth of germanium on conventional silicon substrates, as well as on silicon-germanium substrates covered by a strained silicon layer. With respect to a possible application e.g. as quantum dots, it is desirable to achieve a high density of spatially ordered, small islands, with uniform shape and orientation. This requirements could be met by suitable choice of the epitxial parameter during growth of germanium on conventional silicon (001)-substrates, except for the spatial ordering. The lattice misfit has a fundamental influence on the nucleation of germanium on silicon surfaces. Therefore it has been i...
Nanostructured substrates are an interesting path towards the production of quantum dots devoted to ...
Understanding the process of self-organization of Ge nanostructures on Si with controlled size distr...
Grazing-incidence x-ray diffraction has been utilized to give a direct measure of the lateral strain...
The growth of ordered semiconductor nanostrucutres, with a controlled size and position, is an major...
International audienceThe self-organized growth of germanium quantum dots on square nanopatterned Si...
The present work is dedicated to the experimental investigation of influence of strain, surface reco...
The generally accepted notions about the formation mechanisms for germanium islands with nanometer-s...
Epitaxial growth of germanium quantum dots on an oxidized silicon surface is considered. A kinetic m...
Strained epitaxial growth of Ge on Si(001) produces self-assembled, nanometer scale islands, or quan...
A set of recent results concerning lateral and vertical ordering of Ge islands grown on Si(001) is r...
The current status of the research in the ®eld of synthesis and application of silicon and germanium...
A complete description of Ge growth on vicinal Si(001) surfaces is provided. The distinctive mechani...
A complete description of Ge growth on vicinal Si(001) surfaces is provided. The distinctive mechani...
We investigate the growth behavior and microstructure of Ge self-assembled islands of nanometer dime...
We have followed by scanning tunneling microscopy (STM) the growth of thin Ge films obtained by reac...
Nanostructured substrates are an interesting path towards the production of quantum dots devoted to ...
Understanding the process of self-organization of Ge nanostructures on Si with controlled size distr...
Grazing-incidence x-ray diffraction has been utilized to give a direct measure of the lateral strain...
The growth of ordered semiconductor nanostrucutres, with a controlled size and position, is an major...
International audienceThe self-organized growth of germanium quantum dots on square nanopatterned Si...
The present work is dedicated to the experimental investigation of influence of strain, surface reco...
The generally accepted notions about the formation mechanisms for germanium islands with nanometer-s...
Epitaxial growth of germanium quantum dots on an oxidized silicon surface is considered. A kinetic m...
Strained epitaxial growth of Ge on Si(001) produces self-assembled, nanometer scale islands, or quan...
A set of recent results concerning lateral and vertical ordering of Ge islands grown on Si(001) is r...
The current status of the research in the ®eld of synthesis and application of silicon and germanium...
A complete description of Ge growth on vicinal Si(001) surfaces is provided. The distinctive mechani...
A complete description of Ge growth on vicinal Si(001) surfaces is provided. The distinctive mechani...
We investigate the growth behavior and microstructure of Ge self-assembled islands of nanometer dime...
We have followed by scanning tunneling microscopy (STM) the growth of thin Ge films obtained by reac...
Nanostructured substrates are an interesting path towards the production of quantum dots devoted to ...
Understanding the process of self-organization of Ge nanostructures on Si with controlled size distr...
Grazing-incidence x-ray diffraction has been utilized to give a direct measure of the lateral strain...