Add to ORKGThe subject of this study is a new method of glass etching and its application in microfluidics. Commonly, hydrofluoric acid is used for glass etching. In this study we have tested a new method of glass etching using pressurized hot water. Test motives were prepared using photolitography and metal sputtering on the glass substrate and the etching was performed in a newly developed device capable to compress and heat water to its critical point. Electron microscopy and profilometry have been used for analyzing the surface of the etched glass substrate
A new masking technology useful for wet etching of glass, to a depth of more than 300µm, is reported...
This paper is a review of wet and dry etching of one of the most common types of glass: Pyrex. The p...
A new, versatile architecture is presented for microfluidic devices made entirely from glass, for us...
A new masking technology for wet etching of glass, to a depth of more than 300µm, is reported. Vario...
Soda-lime glass is a commonly used, cheap and accessible material. Just like any other glass, it off...
The objective of this thesis was to establish a good way of wet etching a borosilicate glass named B...
Femtosecond laser irradiation followed by chemical etching (FLICE) is a novel micro-fabrication tech...
This thesis addresses some important issues when designing microfluidic systems for hot pressurized ...
This paper presents processes for glass micromachining, including sandblast, wet etching, reactive i...
A simple and rapid microfabrication method for glass-based microfluidic chips is presented. In this ...
Excellent chemical and physical properties of glass, over a range of operating conditions, make it a...
This thesis introduces important improvements in fabrication of microfluidic devices on silicon and ...
Abstract: Femtosecond laser irradiation followed by chemical etching (FLICE) with hydrofluoric acid ...
Abstract: We report on the fabrication of 3D micro-structures in fused silica glass using chemical e...
The limitations of conventional glass etching methods are a bottleneck in the further development of...
A new masking technology useful for wet etching of glass, to a depth of more than 300µm, is reported...
This paper is a review of wet and dry etching of one of the most common types of glass: Pyrex. The p...
A new, versatile architecture is presented for microfluidic devices made entirely from glass, for us...
A new masking technology for wet etching of glass, to a depth of more than 300µm, is reported. Vario...
Soda-lime glass is a commonly used, cheap and accessible material. Just like any other glass, it off...
The objective of this thesis was to establish a good way of wet etching a borosilicate glass named B...
Femtosecond laser irradiation followed by chemical etching (FLICE) is a novel micro-fabrication tech...
This thesis addresses some important issues when designing microfluidic systems for hot pressurized ...
This paper presents processes for glass micromachining, including sandblast, wet etching, reactive i...
A simple and rapid microfabrication method for glass-based microfluidic chips is presented. In this ...
Excellent chemical and physical properties of glass, over a range of operating conditions, make it a...
This thesis introduces important improvements in fabrication of microfluidic devices on silicon and ...
Abstract: Femtosecond laser irradiation followed by chemical etching (FLICE) with hydrofluoric acid ...
Abstract: We report on the fabrication of 3D micro-structures in fused silica glass using chemical e...
The limitations of conventional glass etching methods are a bottleneck in the further development of...
A new masking technology useful for wet etching of glass, to a depth of more than 300µm, is reported...
This paper is a review of wet and dry etching of one of the most common types of glass: Pyrex. The p...
A new, versatile architecture is presented for microfluidic devices made entirely from glass, for us...