Difúzní bórové pasty pro sítotisk

This paper shows that Boron pastes can make emitter and back surface field (BSF) formation a simple screen print process. It is possible to achieve high quality p+ emitter on n-type silicon wafers. It is shown that bifacial solar cells can easily be fabricated by using n-type silicon wafers and simultaneous diffusion of Boron paste. Diffusion length in excess of 300um is achievable on commercial wafers for solar cell application using screen-printed Boron pastes. These high quality diffusion pastes can reduce manufacturing cost and make it possible to use less than 150 um thick silicon wafers for bifacial solar cell application