Add to ORKGSilicon nitride (Si 3 N4 ) planar optical waveguides have been successfully grown by lowpressure chemical vapor deposition (LPCVD). Silicon p-type wafers with a (100) orientation were used as substrates, and the Si3 N4 was separated from the lossy Si substrate by a thermally grown SiO2 thin film.Peer Reviewe
Si3N4/SiO2 waveguides have been fabricated by low pressure chemical vapor deposition within a comple...
Abstract. We report in this paper the result of thin film fabrication of MEH-PPV and MEH-PPB having ...
Abstract. We report in this paper the result of thin film fabrication of MEH-PPV and MEH-PPB having ...
Silicon nitride (Si 3 N4 ) planar optical waveguides have been successfully grown by lowpressure che...
In view of the integration within Si-based optical devices, LPCVD (low-pressure chemical vapor depos...
In view of the integration within Si-based optical devices, LPCVD (low-pressure chemical vapor depos...
Low-pressure chemical-vapor deposition (LPCVD) thin-film Si3N4 waveguides have been fabricated on S...
Low-pressure chemical-vapor deposition (LPCVD) thin-film Si3N4 waveguides have been fabricated on Si...
A new class of integrated optical waveguide structures is presented, based on low cost CMOS compatib...
[EN] In this paper we report on the characterization of the propagation loss, group index, dispersio...
[EN] In this paper we report on the characterization of the propagation loss, group index, dispersio...
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 20...
Optical waveguides are important for guiding lightwave from a place to other places. Propagation and...
We present the fabrication and optical characterization of stoichiometric Silicon Nitride waveguides...
A new class of integrated optical waveguide structures is presented, based on low cost CMOS compatib...
Si3N4/SiO2 waveguides have been fabricated by low pressure chemical vapor deposition within a comple...
Abstract. We report in this paper the result of thin film fabrication of MEH-PPV and MEH-PPB having ...
Abstract. We report in this paper the result of thin film fabrication of MEH-PPV and MEH-PPB having ...
Silicon nitride (Si 3 N4 ) planar optical waveguides have been successfully grown by lowpressure che...
In view of the integration within Si-based optical devices, LPCVD (low-pressure chemical vapor depos...
In view of the integration within Si-based optical devices, LPCVD (low-pressure chemical vapor depos...
Low-pressure chemical-vapor deposition (LPCVD) thin-film Si3N4 waveguides have been fabricated on S...
Low-pressure chemical-vapor deposition (LPCVD) thin-film Si3N4 waveguides have been fabricated on Si...
A new class of integrated optical waveguide structures is presented, based on low cost CMOS compatib...
[EN] In this paper we report on the characterization of the propagation loss, group index, dispersio...
[EN] In this paper we report on the characterization of the propagation loss, group index, dispersio...
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 20...
Optical waveguides are important for guiding lightwave from a place to other places. Propagation and...
We present the fabrication and optical characterization of stoichiometric Silicon Nitride waveguides...
A new class of integrated optical waveguide structures is presented, based on low cost CMOS compatib...
Si3N4/SiO2 waveguides have been fabricated by low pressure chemical vapor deposition within a comple...
Abstract. We report in this paper the result of thin film fabrication of MEH-PPV and MEH-PPB having ...
Abstract. We report in this paper the result of thin film fabrication of MEH-PPV and MEH-PPB having ...