Add to ORKGA new trend that is becoming dominant is to improve layout regularity so that the layouts to be printed are more repetitive and easy to manufacture. Our proposal is to push to the limit layout regularity to minimize manufacturing costs.Peer Reviewe
Scaling of physical dimensions faster than the optical wavelengths or equipment tolerances used in t...
The time-to-market driven need to maintain concurrent process-design co-development, even in spite o...
Current lithography techniques use a light wavelength of 193nm to print sub-65nm features. This intr...
In nowadays nanometer technology nodes, the semiconductor industry has to deal with the new challeng...
Each reduction of the technology node has, along with improvements in IC fabricationtechnology, been...
Integrated circuit design is limited by manufacturability. As devices scale down, sensitivity to pro...
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer S...
Integrated circuits design faces increasing challenge as we scale down due to the increase of the ef...
As technology scales down, IC design is becoming more difficult due to the increase in process varia...
The gap between VLSI technology and fabrication technology leads to strong refractive effects in lit...
Digital VLSI IC design and manufacturing margins continue to increase in light of process variabilit...
Technical ReportDigital CMOS Integrated Circuits (ICs) suffer from serious layout features printabil...
Increasing variability in today's manufacturing processes causes parametric yield loss that increase...
In the context of regular arithmetic circuits, the effect of pin placement on the quality of layout ...
This paper presents a novel yield model for integrated circuits manufacturing, considering lithograp...
Scaling of physical dimensions faster than the optical wavelengths or equipment tolerances used in t...
The time-to-market driven need to maintain concurrent process-design co-development, even in spite o...
Current lithography techniques use a light wavelength of 193nm to print sub-65nm features. This intr...
In nowadays nanometer technology nodes, the semiconductor industry has to deal with the new challeng...
Each reduction of the technology node has, along with improvements in IC fabricationtechnology, been...
Integrated circuit design is limited by manufacturability. As devices scale down, sensitivity to pro...
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer S...
Integrated circuits design faces increasing challenge as we scale down due to the increase of the ef...
As technology scales down, IC design is becoming more difficult due to the increase in process varia...
The gap between VLSI technology and fabrication technology leads to strong refractive effects in lit...
Digital VLSI IC design and manufacturing margins continue to increase in light of process variabilit...
Technical ReportDigital CMOS Integrated Circuits (ICs) suffer from serious layout features printabil...
Increasing variability in today's manufacturing processes causes parametric yield loss that increase...
In the context of regular arithmetic circuits, the effect of pin placement on the quality of layout ...
This paper presents a novel yield model for integrated circuits manufacturing, considering lithograp...
Scaling of physical dimensions faster than the optical wavelengths or equipment tolerances used in t...
The time-to-market driven need to maintain concurrent process-design co-development, even in spite o...
Current lithography techniques use a light wavelength of 193nm to print sub-65nm features. This intr...