A systematic investigation is performed to determine the effects of the concentration of silver on metal assisted chemical etching (MaCE) for nanostructure formation mechanisms on silicon as well as their resultant optical properties. Silver nitrate concentrations of 8 mM, 4 mM, 3 mM and 2 mM with hydrogen fluoride were used for the preparation of p-type silicon nanostructures. Experimentally, it is observed that when the catalysis molarity concentration is decreased in the etching processes, it resulted in nanostructures ranging from 140 to 60 nm, respectively over the concentrations investigated. A detailed analysis of the optical properties and structure provided insight into the physics of their formation. In addition, the results show ...
The efficient reflection suppression of a solar cell over a broad spectral range can be achieved by ...
Silver nanoparticles were deposited on the surface of polycrystalline silicon wafer via vacuum therm...
Metal-assisted etching (MAE) can be used to form antireflective and light-trapping structures on cry...
A systematic investigation is performed to determine the effects of the concentration of silver on m...
International audienceThis article presents a study on Metal-Assisted Chemical Etching (MACE) of sil...
Nanoscale textured silicon has the potential to overcome the optical challenges faced in the photovo...
International audienceMetal Assisted Chemical Etching (MACE) of Si has attracted the attention of ac...
In this work, upgraded metallurgical grade silicon (UMG-Si) wafer was used to fabricate mesoporous n...
Metal assisted chemical etching (MaCE) of silicon wafers is of interest for fabrication of antirefle...
In this work, slanted, kinked, and straight silicon nanowires (SiNWs) are fabricated on Si(111) and ...
The metal-assisted chemical etching (MACE) technique is commonly employed for texturing the wafer su...
The efficient reflection suppression of a solar cell over a broad spectral range can be achieved by ...
Silver nanoparticles were deposited on the surface of polycrystalline silicon wafer via vacuum therm...
Metal-assisted etching (MAE) can be used to form antireflective and light-trapping structures on cry...
A systematic investigation is performed to determine the effects of the concentration of silver on m...
International audienceThis article presents a study on Metal-Assisted Chemical Etching (MACE) of sil...
Nanoscale textured silicon has the potential to overcome the optical challenges faced in the photovo...
International audienceMetal Assisted Chemical Etching (MACE) of Si has attracted the attention of ac...
In this work, upgraded metallurgical grade silicon (UMG-Si) wafer was used to fabricate mesoporous n...
Metal assisted chemical etching (MaCE) of silicon wafers is of interest for fabrication of antirefle...
In this work, slanted, kinked, and straight silicon nanowires (SiNWs) are fabricated on Si(111) and ...
The metal-assisted chemical etching (MACE) technique is commonly employed for texturing the wafer su...
The efficient reflection suppression of a solar cell over a broad spectral range can be achieved by ...
Silver nanoparticles were deposited on the surface of polycrystalline silicon wafer via vacuum therm...
Metal-assisted etching (MAE) can be used to form antireflective and light-trapping structures on cry...