Ion Beam Patterning of HTS-Thin Films

Ion implantation was used for patterning epitaxial YBCO-thin films. This patterning technique bases on a local disordering of the crystal structure of the MTS due to elastic collisions of the implanted ions. The disordering of the crystal in the irradiated areas leads to a break down uf the superconducting properties. Circular and meandering patterns with a size of 1 mm were prepared for investigations with regard to high-current-applications. Oxygen ions with an energy of 180 keV were used to avoid a contamination of the remaining superconducting-YBCO-path The achieved structures were investigated concerning a dependence on the dose by means of RBS, XRD, AFM as well as magneto-optically. Using an ion fluence of 5 x 10 14 04/cm2 a fully planar panem can be obtained