Optical lithography with printed metal mask and a simple superhydrophobic surface

A nanolithographic optical patterning technique is presented. A metal pattern on a mold is transferred onto a photoresist on a substrate, then the resist with the printed metal mask is flood illuminated. The light passes through only the resist lenses that are formed in the transfer process. Focusing by these lenses results in a significant reduction in the feature size.This work is supported by KOSEF [R01-2006-000-10140-0ACHTUNGTRENUNG(2006)]