This project involves the growth and optimization of the III-V antimony based materials including Indium Arsenide Antimonide (InAsSb) and Aluminum Gallium Antimonide (AlGaSb). The goal of this project is to optimize the MOCVD growth of InAsSb, GaSb, and AlGaSb films through different characterization techniques. Several characterization techniques, such as SEM, AFM, XRD, PL, Hall measurement will be used to determine the optimal dopant concentration and III-V ratio so as to produce the ideal films. The factors affecting the growth of the films and the future research development will be discussed in this report as well.Bachelor of Engineerin
Abstract. GaSb and Al GaSb are narrow gap semiconductors, is of current interest, for its optoelectr...
The crystal quality and structural properties of GaSb thin films grown on a semi-insulator GaAs (001...
Abstract — In this study Aluminum Antimonide (AlSb) thin films were synthesized by electro-depositio...
Antimony semiconductors are materials of future for short and mid infrared emitters and detectors. T...
The qualities of GaSb substrates commonly used for the preparation of III-V antimonide epilayers wer...
Epitaxial Alx Ga1-x Sb layers on GaSb and GaAs substrates have been grown by atmospheric pressure me...
Investigations related to the bulk and thin film growth of two of the antimony based semiconductors,...
Experimental results on MOCVD epitaxy of some antimonides on GaSb substrates are presented. Specific...
Antimony is a promising material for the fabrication of photodetectors. This study deals with the gr...
Low pressure metalorganic chemical vapour deposition (LP-MOCVD) growth and characteristics of InAssb...
The results presented in this work cover a wide range of both fundamental and applied aspects. These...
The surface analytical techniques of Auger electron spectroscopy, temperature programmed desorption,...
Aluminum antimony (AlSb) is an indirect band gap semiconductor with Eg of about 1.62 eV at 300 K and...
This report is about characterization of the narrow bandgap semiconductor. The semiconductor used in...
A thin film semiconductor device was grown by MBE methods, characterized for material quality and ev...
Abstract. GaSb and Al GaSb are narrow gap semiconductors, is of current interest, for its optoelectr...
The crystal quality and structural properties of GaSb thin films grown on a semi-insulator GaAs (001...
Abstract — In this study Aluminum Antimonide (AlSb) thin films were synthesized by electro-depositio...
Antimony semiconductors are materials of future for short and mid infrared emitters and detectors. T...
The qualities of GaSb substrates commonly used for the preparation of III-V antimonide epilayers wer...
Epitaxial Alx Ga1-x Sb layers on GaSb and GaAs substrates have been grown by atmospheric pressure me...
Investigations related to the bulk and thin film growth of two of the antimony based semiconductors,...
Experimental results on MOCVD epitaxy of some antimonides on GaSb substrates are presented. Specific...
Antimony is a promising material for the fabrication of photodetectors. This study deals with the gr...
Low pressure metalorganic chemical vapour deposition (LP-MOCVD) growth and characteristics of InAssb...
The results presented in this work cover a wide range of both fundamental and applied aspects. These...
The surface analytical techniques of Auger electron spectroscopy, temperature programmed desorption,...
Aluminum antimony (AlSb) is an indirect band gap semiconductor with Eg of about 1.62 eV at 300 K and...
This report is about characterization of the narrow bandgap semiconductor. The semiconductor used in...
A thin film semiconductor device was grown by MBE methods, characterized for material quality and ev...
Abstract. GaSb and Al GaSb are narrow gap semiconductors, is of current interest, for its optoelectr...
The crystal quality and structural properties of GaSb thin films grown on a semi-insulator GaAs (001...
Abstract — In this study Aluminum Antimonide (AlSb) thin films were synthesized by electro-depositio...