Add to ORKGThe objectives of the proposed Project are as follows: a) Development of High Aspect Ratio Micro- and Nano-Imprint Lithography for patterning over large surface areas. b) Development of soft-on-hard mold technology as an enabling technology for low pressure molding of high aspect ratio polymeric micro-structures and nano-structures. c) Development of ultrathin polymer film coating or grafting for release application. d) Development of novel release coating with good release and durability
The convergence of micro-/nano-electromechanical systems (MEMS/NEMS) and biomedical industries is cr...
A novel imprint process, called Disposable Master Technology has been developed using disposable mas...
Nanoimprint lithography is a potential technology for fabrication of large scale integration systems...
We have developed a lithography process which originates from imprint lithography and offers advanta...
Abstract—This paper examines aspects of a soft nanoimprint lithography technique for operation at re...
Soft UV nanoimprint lithography and reactive ion etch techniques have been used to pattern high dens...
Soft nanoimprint lithography (soft NIL) relies on a mechanical deformation of a resist by a patterne...
Soft UV-imprint lithography at sub-micron dimensions was achieved in thin films of photopolymer resi...
This is a brief review of our recent and ongoing work on simple, rapid, room temperature, pressure-l...
The current trend in pushing photo lithography to smaller and smaller resolutions is becoming increa...
We have demonstrated multi-step room-temperature nanoimprint lithography (RTNIL) using polystyrene (...
In this work we describe a new method suitable for large area nanoimprint lithography. In step&s...
Industrially efficient lithography process requires high throughput production, wafer scale patterni...
We developed a hybrid nanoimprint-soft lithography technique with sub-15 nm resolution. It is capabl...
This thesis describes different aspects of nanotechnology manufacturing with nanoimprint lithography...
The convergence of micro-/nano-electromechanical systems (MEMS/NEMS) and biomedical industries is cr...
A novel imprint process, called Disposable Master Technology has been developed using disposable mas...
Nanoimprint lithography is a potential technology for fabrication of large scale integration systems...
We have developed a lithography process which originates from imprint lithography and offers advanta...
Abstract—This paper examines aspects of a soft nanoimprint lithography technique for operation at re...
Soft UV nanoimprint lithography and reactive ion etch techniques have been used to pattern high dens...
Soft nanoimprint lithography (soft NIL) relies on a mechanical deformation of a resist by a patterne...
Soft UV-imprint lithography at sub-micron dimensions was achieved in thin films of photopolymer resi...
This is a brief review of our recent and ongoing work on simple, rapid, room temperature, pressure-l...
The current trend in pushing photo lithography to smaller and smaller resolutions is becoming increa...
We have demonstrated multi-step room-temperature nanoimprint lithography (RTNIL) using polystyrene (...
In this work we describe a new method suitable for large area nanoimprint lithography. In step&s...
Industrially efficient lithography process requires high throughput production, wafer scale patterni...
We developed a hybrid nanoimprint-soft lithography technique with sub-15 nm resolution. It is capabl...
This thesis describes different aspects of nanotechnology manufacturing with nanoimprint lithography...
The convergence of micro-/nano-electromechanical systems (MEMS/NEMS) and biomedical industries is cr...
A novel imprint process, called Disposable Master Technology has been developed using disposable mas...
Nanoimprint lithography is a potential technology for fabrication of large scale integration systems...