Synchrotron radiation X-ray absorption and UV 325 nm excitation Raman scattering- photoluminescence (PL) have been employed to investigate a series of 4H-SiC wafers, including bulk, epitaxial single or multiple layer structures by chemical vapor deposition. Significant results on the atomic bonding and PL-Raman properties are obtained from these comparative studies
Large area microcrystalline and polycrystalline SiC thin films have been grown by electron cyclotron...
Homoepitaxial growth of 4H-SiC p(+)/pi/n(-) multi-epilayer on n(+) substrate and in-situ doping of p...
Photoluminescence spectroscopy is one of the most efficient and sensitive non-contact techniques use...
UV scanning photoluminescence spectroscopy is applied to 4H-SiC epitaxy characterization. In a firs...
In this work, 4H SiC samples with a multilayer structure (shallow implanted layer in a lowly doped n...
Recent progress in growth of high quality 4H- SiC and 6H-SiC polytypes materials may lead to new app...
International audienceRecent improvements in the implementation of the technique make Raman spectros...
The cathodoluminescence (CL) technique is used to analyse the radiative recombination properties of ...
The cathodoluminescence (CL) technique is used to analyse the radiative recombination properties of ...
International audienceRaman imaging measurements have been used to determine the spatial distributio...
The crystal quality of a 4H-silicon carbide (4H-SiC) epitaxial layer is crucial to the development o...
International audienceReflection synchrotron topography, integrated photoluminescence imaging and Ra...
The effects of Chem-Mechanical Polishing (CMP) and Rapid Thermal Annealing (RTA) on n-type 4H:SiC sa...
Raman spectroscopy and sheet resistance measurements were used to study the preparation processes of...
The quality of the N-doped 4H-SiC homoepitaxial layers grown via hot-wall horizontal chemical vapor ...
Large area microcrystalline and polycrystalline SiC thin films have been grown by electron cyclotron...
Homoepitaxial growth of 4H-SiC p(+)/pi/n(-) multi-epilayer on n(+) substrate and in-situ doping of p...
Photoluminescence spectroscopy is one of the most efficient and sensitive non-contact techniques use...
UV scanning photoluminescence spectroscopy is applied to 4H-SiC epitaxy characterization. In a firs...
In this work, 4H SiC samples with a multilayer structure (shallow implanted layer in a lowly doped n...
Recent progress in growth of high quality 4H- SiC and 6H-SiC polytypes materials may lead to new app...
International audienceRecent improvements in the implementation of the technique make Raman spectros...
The cathodoluminescence (CL) technique is used to analyse the radiative recombination properties of ...
The cathodoluminescence (CL) technique is used to analyse the radiative recombination properties of ...
International audienceRaman imaging measurements have been used to determine the spatial distributio...
The crystal quality of a 4H-silicon carbide (4H-SiC) epitaxial layer is crucial to the development o...
International audienceReflection synchrotron topography, integrated photoluminescence imaging and Ra...
The effects of Chem-Mechanical Polishing (CMP) and Rapid Thermal Annealing (RTA) on n-type 4H:SiC sa...
Raman spectroscopy and sheet resistance measurements were used to study the preparation processes of...
The quality of the N-doped 4H-SiC homoepitaxial layers grown via hot-wall horizontal chemical vapor ...
Large area microcrystalline and polycrystalline SiC thin films have been grown by electron cyclotron...
Homoepitaxial growth of 4H-SiC p(+)/pi/n(-) multi-epilayer on n(+) substrate and in-situ doping of p...
Photoluminescence spectroscopy is one of the most efficient and sensitive non-contact techniques use...