The structure of the germanium-silicon interface has been analyzed by x-ray standing waves in an ultrahigh-vacuum environment. Structural models of the Si(111) (7×7) surface have been tested through the structure and energetics of the Si(111)(7×7)-Ge interface. Our results agree with the dimer-adatom stacking-fault model of Takayanagi et al. for the bare surface. At the interface, Ge atoms occupy the atop sites on the surface atoms that offer dangling bonds as well as on the adatoms of the dimer-adatom stacking-fault model of the Si(111) (7×7) surface
We have performed a detailed x-ray diffraction study of the structure of the 7×7 and 5×5 reconstruct...
The study of growth and evolution of Ge/Si(111) islands by STM and AFM is presented and discussed. T...
Apparently, silicon - a group-IV semiconductor is the basis of the multi-billion dollar industry of ...
The structure of the germanium-silicon interface has been analyzed by x-ray standing waves in an ult...
The structure of the germanium-silicon interface has been analyzed by x-ray standing waves in an ult...
The positions of germanium atoms adsorbed on Si(111) surfaces have been determined with X-ray standi...
The position of germanium atoms on a Si(111) (7×7) surface prepared in a molecular-beam-epitaxy syst...
Based on SEXAFS experiments, a new model for the structure of the Si(111)7 \uc3\u97 7: Ge interface ...
To be published in: Phys. Rev. Lett.SIGLECopy held by FIZ Karlsruhe; available from UB/TIB Hannover ...
Cluster model calculations on germanium adsorption onto the Si(111)-7×7 surface are performed with t...
The tensile-strained Si(111) layers grown on top of Ge(111) substrates are studied by combining scan...
The average relaxation of the top layers of a germanium-atom-tagged Si(111) surface has been measure...
We have determined the atomic structure of the Ge-covered Si(100) surface in one-monolayer coverage ...
As a precursor to x-ray standing wave studies using electron detection as a surface probe, an invest...
We have performed an x-ray diffraction study of the Ge(111)-c(2×8) surface. From the analysis of 43 ...
We have performed a detailed x-ray diffraction study of the structure of the 7×7 and 5×5 reconstruct...
The study of growth and evolution of Ge/Si(111) islands by STM and AFM is presented and discussed. T...
Apparently, silicon - a group-IV semiconductor is the basis of the multi-billion dollar industry of ...
The structure of the germanium-silicon interface has been analyzed by x-ray standing waves in an ult...
The structure of the germanium-silicon interface has been analyzed by x-ray standing waves in an ult...
The positions of germanium atoms adsorbed on Si(111) surfaces have been determined with X-ray standi...
The position of germanium atoms on a Si(111) (7×7) surface prepared in a molecular-beam-epitaxy syst...
Based on SEXAFS experiments, a new model for the structure of the Si(111)7 \uc3\u97 7: Ge interface ...
To be published in: Phys. Rev. Lett.SIGLECopy held by FIZ Karlsruhe; available from UB/TIB Hannover ...
Cluster model calculations on germanium adsorption onto the Si(111)-7×7 surface are performed with t...
The tensile-strained Si(111) layers grown on top of Ge(111) substrates are studied by combining scan...
The average relaxation of the top layers of a germanium-atom-tagged Si(111) surface has been measure...
We have determined the atomic structure of the Ge-covered Si(100) surface in one-monolayer coverage ...
As a precursor to x-ray standing wave studies using electron detection as a surface probe, an invest...
We have performed an x-ray diffraction study of the Ge(111)-c(2×8) surface. From the analysis of 43 ...
We have performed a detailed x-ray diffraction study of the structure of the 7×7 and 5×5 reconstruct...
The study of growth and evolution of Ge/Si(111) islands by STM and AFM is presented and discussed. T...
Apparently, silicon - a group-IV semiconductor is the basis of the multi-billion dollar industry of ...