Reactive polymers: Part I-Novel polystyrene-anchored copper(II), nickel(II), cobalt(II), iron(m), zinc(II), cadmium(II), molybdenum(VI) and uranium(VI) complexes of the chelating resin containing thiosemicarbazone

861-867A new chelating resin containing thiosemicarbazone has been synthesized by the reaction of aldehydopolystyrene and thiosemicarbazide. The polystyrene bound thiosemicarbazone reacts with salicylaldehyde leading to the formation of a new schiff base chelating resin which reacts with. Sodium monochloroacetate and gives the polymer bound S-acetatothiosemicarbazone. The new chelating resin forms complexes of the types PS-LCuX·S, PS-LNiX·3S, PS-LHNi(acac)2, PS-LCoX·3S, PSLFeX2·2S, PS-LZnX·S, PS-LCdX·S, PS-LMoO2(acac) and PS-LUO2X·S (where PS-LH = polymeranchored ligand; S=DMF or CH3OH; X=C1- or CH3COO- and acacH = acetylacetone). The chelating resins and complexes have been characterized by elemental analysis, IR and electronic spectra and magnetic measurements. The Cu(II), Ni(U), Co(II) and Fe(III) complexes are paramagnetic while the Zn(II), Cd(II), Mo(VI) and U(VI) complexes are diamagnetic. The IR data indicate the thioenolization of the ligand in the complexes (except in PS-LHNi(acac)2 where it behaves as a neutral bi-dentate ligand)