683-688The temperature dependence of threshold voltage and drain-source current of thin film SOI MOSFETs has been investigated and modelled for a non-uniform distribution in the silicon film, taking into account the field dependent Mobility, and fringing field effects near the drain and source ends. A decrease in threshold voltage and drain current with increase in temperature is established. The predictions of the model are in good agreement with the experimental data. The model is valid for both short -channel and long-channel devices.</span
Previous conflicting reports concerning fully-depleted SOI device hot electron reliability is partia...
International audienceWe investigated the characteristics of state-of-the-art FDSOI MOSFETs in a wid...
Summary form only given. The authors discuss the importance and the modeling of some characteristics...
The threshold voltage and capacitance voltage characteristics of ultra-thin Silicon-on-Insulator MOS...
In this paper specific features of the multiple-gate MOSFETs (MuGFETs) behavior at high temperatures...
This paper presents the influence of the drain bias and gate length of partially depleted SOI MOSFET...
Intrinsic gate-capacitance characteristics of long-channel SOI MOSFETs are investigated by measureme...
In this paper, we analyze the combined effects of size quantization and device temperature variation...
Previous conflicting reports concerning fully depleted SOI device hot electron reliability may resul...
Silicon on insulator (SOI) devices have been of great interest in these years. In this paper, simula...
Silicon-On-Insulator (SOI) technology, which was originally developed for military applications, is ...
This model is developed for the saturation region based on a detailed analysis of special physical e...
In this paper off-state drain currents in long-channel inversion mode SOI MOSFETs are investigated i...
Thin-film SOI MOSFETs are known to have superior device properties for hightemperature applications,...
This paper presents an analytical model for calculating the threshold voltage in nanocrystalline sil...
Previous conflicting reports concerning fully-depleted SOI device hot electron reliability is partia...
International audienceWe investigated the characteristics of state-of-the-art FDSOI MOSFETs in a wid...
Summary form only given. The authors discuss the importance and the modeling of some characteristics...
The threshold voltage and capacitance voltage characteristics of ultra-thin Silicon-on-Insulator MOS...
In this paper specific features of the multiple-gate MOSFETs (MuGFETs) behavior at high temperatures...
This paper presents the influence of the drain bias and gate length of partially depleted SOI MOSFET...
Intrinsic gate-capacitance characteristics of long-channel SOI MOSFETs are investigated by measureme...
In this paper, we analyze the combined effects of size quantization and device temperature variation...
Previous conflicting reports concerning fully depleted SOI device hot electron reliability may resul...
Silicon on insulator (SOI) devices have been of great interest in these years. In this paper, simula...
Silicon-On-Insulator (SOI) technology, which was originally developed for military applications, is ...
This model is developed for the saturation region based on a detailed analysis of special physical e...
In this paper off-state drain currents in long-channel inversion mode SOI MOSFETs are investigated i...
Thin-film SOI MOSFETs are known to have superior device properties for hightemperature applications,...
This paper presents an analytical model for calculating the threshold voltage in nanocrystalline sil...
Previous conflicting reports concerning fully-depleted SOI device hot electron reliability is partia...
International audienceWe investigated the characteristics of state-of-the-art FDSOI MOSFETs in a wid...
Summary form only given. The authors discuss the importance and the modeling of some characteristics...