Nanocomposite Al-Si-N coatings have been successfully deposited by d.c. magnetron sputtering on different technological important substrates such as Si, SS-304, and glass. In this manuscript, the structural, mechanical, and optical properties of the Al-Si-N have been investigated. A solid solution of Al-Si-N phase is formed with a wurtzite hexagonal nc-AlN structure. The Al-Si-N films showed a high hardness 30GPa, modulus 300GPa, and elastic recovery, We=54% and H/E=0.1, which are the essential conditions for enhanced crack-resistant coatings. Moreover, the films were optically transparent in ultraviolet and visible range with a transparency of 90% with an optical band gap of 3.8eV. Copyright (c) 2016 John Wiley & Sons, Ltd
(Ti,Al,Si)N films have been prepared by d.c. and rf reactive magnetron sputtering, with Si contents ...
Coatings consisting of Al, Sn and N have been deposited using co-sputtering from Al and Sn targets i...
AlN films of thicknesses 670–780 nm were deposited on (1 1 1) silicon wafer, (0 0·1) sapphire, float...
The paper presents the results of investigations of the structural and phase conditions, mechanical ...
Hard and optically transparent nanocomposite Al-Si-N thin films were deposited using DC magnetron sp...
Magnetron sputtered Al–Si–N thin films with varying silicon content were developed by Al–Si target w...
Abstract: In this paper, we study the optical properties of aluminum- and silicon-nitride films and ...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
New superhard Ti-Al-Si-N films, characterized by a nanocomposite comprising nano-sized (Ti,Al,Si)N c...
A multilayer is a composite structure of one or more constituent materials, with layer thicknesses r...
Ž.Ti,Al,Si N films have been prepared by d.c. and rf reactive magnetron sputtering, with Si contents...
Al-Si-N thin films were deposited on glass substrates at varying nitrogen partial pressure through m...
There is an increasing demand for glass materials with better mechanical and optical properties for ...
Ca-Si-O-N thin films were deposited on commercial soda-lime silicate float glass, silica wafers and ...
(Ti,Al,Si)N films have been prepared by d.c. and rf reactive magnetron sputtering, with Si contents ...
Coatings consisting of Al, Sn and N have been deposited using co-sputtering from Al and Sn targets i...
AlN films of thicknesses 670–780 nm were deposited on (1 1 1) silicon wafer, (0 0·1) sapphire, float...
The paper presents the results of investigations of the structural and phase conditions, mechanical ...
Hard and optically transparent nanocomposite Al-Si-N thin films were deposited using DC magnetron sp...
Magnetron sputtered Al–Si–N thin films with varying silicon content were developed by Al–Si target w...
Abstract: In this paper, we study the optical properties of aluminum- and silicon-nitride films and ...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
New superhard Ti-Al-Si-N films, characterized by a nanocomposite comprising nano-sized (Ti,Al,Si)N c...
A multilayer is a composite structure of one or more constituent materials, with layer thicknesses r...
Ž.Ti,Al,Si N films have been prepared by d.c. and rf reactive magnetron sputtering, with Si contents...
Al-Si-N thin films were deposited on glass substrates at varying nitrogen partial pressure through m...
There is an increasing demand for glass materials with better mechanical and optical properties for ...
Ca-Si-O-N thin films were deposited on commercial soda-lime silicate float glass, silica wafers and ...
(Ti,Al,Si)N films have been prepared by d.c. and rf reactive magnetron sputtering, with Si contents ...
Coatings consisting of Al, Sn and N have been deposited using co-sputtering from Al and Sn targets i...
AlN films of thicknesses 670–780 nm were deposited on (1 1 1) silicon wafer, (0 0·1) sapphire, float...