Ti–Si–B–C–N film was deposited by DC magnetron sputtering at different argon and nitrogen ratios such as N2/Ar = 1 : 5, 2 : 4, 3 : 3, 4 : 1 and 5 : 0. The formation of TiN and TiB phases was observed because of incorporation of nitrogen. The hardness, modulus, microstructure, structure and bond formation with different nitrogen contents during the deposition were studied by nanoindentation, scanning electron microscope, X-ray diffraction and X-ray photoelectron spectroscopy, respectively. The oxidation kinetics of Ti–Si–B–C–N was investigated. The nitrogen incorporation during deposition influences different properties of the coating. Hardness and modulus decreased, and microstructure showed very fine grain presence, and film changes to ful...
Titanium nitride thin films are widely used in biomedical implants because of their biocompatibility...
We investigate the deposition of TiWSiNx thin films by means of the method of reactive magnetron co-...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
Titanium–boron–nitrogen (Ti–B–N) films were deposited by DC reactive magnetron sputtering using sing...
Effects of nitrogen content on the microstructure, hardness, and friction coefficient of Ti-Mo-N coa...
This study examines the structure and properties of stainless steel coatings deposited to incorporat...
Thin film Ni(Ti) nanocomposite coatings, containing both oxygen and nitrogen, were deposited onto to...
Titanium nitride films were deposited by reactive magnetron sputtering on Si (100) wafers, glass and...
A series of Ti–B–(N) coatings prepared by dc magnetron sputtering using TiB2 targets in Ar/N2 gas mi...
Nanocomposite coatings consisting of Ti(C,N) nanocrystallites embedded in an amorphous carbon-based ...
Ti–B–(N) coatings have been deposited by DC magnetron sputtering using TiB2 targets in Ar/N2 gas mix...
Abstract. It has been a common practice that in the deposition of a ceramic coating onto a sub-strat...
[[abstract]]Nanocrystalline TiN thin films were deposited on (100) silicon wafers using an unbalance...
Within the frame of this work, the TiNx samples were deposited by reactive dc magnetron sputtering, ...
Ti-Si-N nanocomposite films were prepared by co-sputtering Ti and Si targets in Ar/N2 gas atmosphere...
Titanium nitride thin films are widely used in biomedical implants because of their biocompatibility...
We investigate the deposition of TiWSiNx thin films by means of the method of reactive magnetron co-...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
Titanium–boron–nitrogen (Ti–B–N) films were deposited by DC reactive magnetron sputtering using sing...
Effects of nitrogen content on the microstructure, hardness, and friction coefficient of Ti-Mo-N coa...
This study examines the structure and properties of stainless steel coatings deposited to incorporat...
Thin film Ni(Ti) nanocomposite coatings, containing both oxygen and nitrogen, were deposited onto to...
Titanium nitride films were deposited by reactive magnetron sputtering on Si (100) wafers, glass and...
A series of Ti–B–(N) coatings prepared by dc magnetron sputtering using TiB2 targets in Ar/N2 gas mi...
Nanocomposite coatings consisting of Ti(C,N) nanocrystallites embedded in an amorphous carbon-based ...
Ti–B–(N) coatings have been deposited by DC magnetron sputtering using TiB2 targets in Ar/N2 gas mix...
Abstract. It has been a common practice that in the deposition of a ceramic coating onto a sub-strat...
[[abstract]]Nanocrystalline TiN thin films were deposited on (100) silicon wafers using an unbalance...
Within the frame of this work, the TiNx samples were deposited by reactive dc magnetron sputtering, ...
Ti-Si-N nanocomposite films were prepared by co-sputtering Ti and Si targets in Ar/N2 gas atmosphere...
Titanium nitride thin films are widely used in biomedical implants because of their biocompatibility...
We investigate the deposition of TiWSiNx thin films by means of the method of reactive magnetron co-...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...