The plastic subsurface damages distribution of fused silica optics polished with different pads are investigated. The elastic interaction model, plastic indentation model and wear relationships are combined together to theoretically characterize the plastic subsurface damages distribution in different polishing processes, which shows consistent results with experiments. It reveals that most of the polishing induced subsurface damages are plastic damages. A few largest polishing particles in the tail end distribution mainly decide the final depth distribution and density of the polishing induced plastic subsurface damages. The larger pad elastic modulus will make the few largest polishing particles bear much larger load and generate larger p...
AbstractSurface integrity of optics used in high power laser systems is vital to their successful ap...
International audienceIn this work, the polishing-induced contamination layer at the fused silica op...
International audienceIn this work, the polishing-induced contamination layer at the fused silica op...
The plastic subsurface damages distribution of fused silica optics polished with different pads are ...
The plastic subsurface damages distribution of fused silica optics polished with different pads are ...
The plastic subsurface damages distribution of fused silica optics polished with different pads are ...
The material removal and surface figure after ceria pad polishing of fused silica glass have been me...
Abstract The material removal and surface figure after ceria pad polishing of fused silica glass hav...
Various ceria and colloidal silica polishing slurries were used to polish fused silica glass workpie...
The objective of this work is to develop a solid scientific understanding of the creation and charac...
In optical fabrication, brittle-hard materials are used for numerous applications. Especially for hi...
Managing subsurface damage during the shaping process and removing subsurface damage during the poli...
It is well known that the chemical reaction between an oxide layer and a water-based slurry produces...
International audienceLarge high-power laser facilities such as megajoule laser (LMJ) or National Ig...
The optical damage threshold of indentation induced flaws on fused silica surfaces was explored. Mec...
AbstractSurface integrity of optics used in high power laser systems is vital to their successful ap...
International audienceIn this work, the polishing-induced contamination layer at the fused silica op...
International audienceIn this work, the polishing-induced contamination layer at the fused silica op...
The plastic subsurface damages distribution of fused silica optics polished with different pads are ...
The plastic subsurface damages distribution of fused silica optics polished with different pads are ...
The plastic subsurface damages distribution of fused silica optics polished with different pads are ...
The material removal and surface figure after ceria pad polishing of fused silica glass have been me...
Abstract The material removal and surface figure after ceria pad polishing of fused silica glass hav...
Various ceria and colloidal silica polishing slurries were used to polish fused silica glass workpie...
The objective of this work is to develop a solid scientific understanding of the creation and charac...
In optical fabrication, brittle-hard materials are used for numerous applications. Especially for hi...
Managing subsurface damage during the shaping process and removing subsurface damage during the poli...
It is well known that the chemical reaction between an oxide layer and a water-based slurry produces...
International audienceLarge high-power laser facilities such as megajoule laser (LMJ) or National Ig...
The optical damage threshold of indentation induced flaws on fused silica surfaces was explored. Mec...
AbstractSurface integrity of optics used in high power laser systems is vital to their successful ap...
International audienceIn this work, the polishing-induced contamination layer at the fused silica op...
International audienceIn this work, the polishing-induced contamination layer at the fused silica op...