After reviewing the principle of the method for determining, in the far ultraviolet, the optical constants of thin dielectric films, results for some alkali fluorides and alkaline earth fluorides are presented. The variations, with film thickness, of the vacuum-film surface reflecting power, can be related to the layer structure, and the order of magnitude of the surface irregularities on the coating can be deduced.Après avoir rappelé le principe de la méthode de détermination dans l'ultraviolet lointain, des constantes optiques de couches minces diélectriques, on présente les résultats relatifs à quelques fluorures alcalins et alcalino-terreux. Les variations, avec l'épaisseur du dépôt, du facteur de réflexion superficiel, vide-couche, peu...
The persistent utilization of optical lithography at the DUV and VUV excimer laser wavelengths leads...
The determination of fundamental optical parameters is essential for the development of new optical ...
The full expression for the minima of transmission and reflection spectra of a thin absorbing film a...
After reviewing the principle of the method for determining, in the far ultraviolet, the optical con...
[[abstract]]The determination of optical constants of thin films is an important requirement for the...
10 págs.Multilayer coatings in the far UV (FUV) are required for various fields of application, such...
Polycrystalline, dielectric thin films are grown by the ultrahigh vacuum technique of molecular-beam...
18 pags., 11 figs., 3 tabs.Various fluorides are materials in nature that extend their transparency ...
The response of a medium with respect to electromagnetic fields is commonly described in terms of it...
Fluorides and oxides are classical materials for optical coatings. At present, fundamental improveme...
Fluorides and oxides are classical materials for optical coatings. At present, fundamental improveme...
The present candidates for low loss dielectric optical coatings at VUV excimer laser wavelengths are...
A description is given of an apparatus for evaporation under ultra-high vacuum (5 × 10—10 Torr) of t...
In this work, vacuum ultra violet reflectometry (VUV-R) is applied to measure the film thickness of ...
As a result of health and safety issues surrounding the use of radioactive materials on coated optic...
The persistent utilization of optical lithography at the DUV and VUV excimer laser wavelengths leads...
The determination of fundamental optical parameters is essential for the development of new optical ...
The full expression for the minima of transmission and reflection spectra of a thin absorbing film a...
After reviewing the principle of the method for determining, in the far ultraviolet, the optical con...
[[abstract]]The determination of optical constants of thin films is an important requirement for the...
10 págs.Multilayer coatings in the far UV (FUV) are required for various fields of application, such...
Polycrystalline, dielectric thin films are grown by the ultrahigh vacuum technique of molecular-beam...
18 pags., 11 figs., 3 tabs.Various fluorides are materials in nature that extend their transparency ...
The response of a medium with respect to electromagnetic fields is commonly described in terms of it...
Fluorides and oxides are classical materials for optical coatings. At present, fundamental improveme...
Fluorides and oxides are classical materials for optical coatings. At present, fundamental improveme...
The present candidates for low loss dielectric optical coatings at VUV excimer laser wavelengths are...
A description is given of an apparatus for evaporation under ultra-high vacuum (5 × 10—10 Torr) of t...
In this work, vacuum ultra violet reflectometry (VUV-R) is applied to measure the film thickness of ...
As a result of health and safety issues surrounding the use of radioactive materials on coated optic...
The persistent utilization of optical lithography at the DUV and VUV excimer laser wavelengths leads...
The determination of fundamental optical parameters is essential for the development of new optical ...
The full expression for the minima of transmission and reflection spectra of a thin absorbing film a...