The properties of (HFA)Cu . l,5-COD complex, being the prospective CVD-precursor for thin copper films for microelectronics, were investigated by UV (He 1) photoelectron, X-ray fluorescent spectroscopy and mass-spectroscopy together with ab initio calculations in approximation of density functional theory. The detailed analysis of energy and structure of highest occupied MO'S of (HFA)Cu . 1,5-COD was carried out. The thermodynamical and kinetical parameters of thermolysis reaction for (HFA)Cu . l,5-COD were determined and discussed. The initial stages of growth of thin copper films on the basis of this precursor (Si3N4 substrates) were studied by high-resolution transmission electron microscopy and X-ray photoelectron spectroscopy
The wonder of the last century has been the rapid development in technology. One of the sectors that...
Copper has become the material of choice for metallization of high-performance ultra-large scale in...
Metalorganic complexes of copper have been synthesized by modifying the ligand in the beta-diketonat...
The properties of (HFA)Cu . l,5-COD complex, being the prospective CVD-precursor for thin copper fil...
Equilibrium concentrations of various condensed and gaseous phases have been thermodynamically calcu...
[[abstract]]This work demonstrated for the first time low temperature copper (Cu) film deposition by...
[[abstract]]This work demonstrated for the first time low temperature copper (Cu) film deposition by...
[[abstract]]This work demonstrated for the first time low temperature copper (Cu) film deposition by...
This work is focused on a joint experimental and theoretical characterization of M(hfa)2•TMEDA compl...
A novel CVD copper process is described using two new copper CVD precursors, KI3 and KI5, for the fa...
A copper(II) hexafluoroacetylacetonate (1,1,1,5,5,5-hexafluoro-2,4-pentanedionate, hfa) adduct with ...
The nucleation and successful growth of copper (Cu) thin films on diffusion barrier/adhesion promote...
For the metalorganic chemical vapor deposition (MOCVD) of copper films using the β-diketonate comple...
An organometallic precursor, (hexafluoroacetyl-acetonate, hfac)Cu-(1)(vinylcyclohexane, VCH) was stu...
Bahlawane N, Premkumar PA, Reilmann F, et al. CVD of Conducting Ultrathin Copper Films. JOURNAL OF T...
The wonder of the last century has been the rapid development in technology. One of the sectors that...
Copper has become the material of choice for metallization of high-performance ultra-large scale in...
Metalorganic complexes of copper have been synthesized by modifying the ligand in the beta-diketonat...
The properties of (HFA)Cu . l,5-COD complex, being the prospective CVD-precursor for thin copper fil...
Equilibrium concentrations of various condensed and gaseous phases have been thermodynamically calcu...
[[abstract]]This work demonstrated for the first time low temperature copper (Cu) film deposition by...
[[abstract]]This work demonstrated for the first time low temperature copper (Cu) film deposition by...
[[abstract]]This work demonstrated for the first time low temperature copper (Cu) film deposition by...
This work is focused on a joint experimental and theoretical characterization of M(hfa)2•TMEDA compl...
A novel CVD copper process is described using two new copper CVD precursors, KI3 and KI5, for the fa...
A copper(II) hexafluoroacetylacetonate (1,1,1,5,5,5-hexafluoro-2,4-pentanedionate, hfa) adduct with ...
The nucleation and successful growth of copper (Cu) thin films on diffusion barrier/adhesion promote...
For the metalorganic chemical vapor deposition (MOCVD) of copper films using the β-diketonate comple...
An organometallic precursor, (hexafluoroacetyl-acetonate, hfac)Cu-(1)(vinylcyclohexane, VCH) was stu...
Bahlawane N, Premkumar PA, Reilmann F, et al. CVD of Conducting Ultrathin Copper Films. JOURNAL OF T...
The wonder of the last century has been the rapid development in technology. One of the sectors that...
Copper has become the material of choice for metallization of high-performance ultra-large scale in...
Metalorganic complexes of copper have been synthesized by modifying the ligand in the beta-diketonat...