This paper constitutes the first part of a work devoted to applications of piezoresistance effects in germanium and silicon semiconductors. In this part, emphasis is placed on a formal explanation of non-linear effects. We propose a brief phenomenological description based on the multi-valleys model of semiconductors before to adopt a macroscopic tensorial model from which general analytical expressions for primed non-linear piezoresistance coefficients are derived. Graphical representations of linear and non-linear piezoresistance coefficients allows us to characterize the influence of the two angles of cut and of directions of alignment. The second part will primarily deal with specific applications for piezoresistive sensors.Cette public...
AbstractUsing the fabrication techniques and materials of microelectronics as a basis, microelectrom...
The aim of this letter is to include the contribution of the optical phonon scattering mechanism in ...
The piezoresistive behavior of n + -diffusions in monocrystalline CMOS-processed silicon is calibr...
This paper constitutes the first part of a work devoted to applications of piezoresistance effects i...
This paper is devoted to the theoretical study of the influence of the temperature and of the doping...
Abstract- This contribution deals with possible reasons for the non-linear behaviour of piezoelectri...
We present a novel ab initio approach to piezoelectricity. The piezoelectric tensor is given by the ...
This thesis describes an investigation of the piezojunction effect in silicon. The aim of this inves...
This thesis describes an investigation of the piezojunction effect in silicon. The aim of this inves...
A full investigation into the piezoresistive effect in polycrystalline silicon is described. A theor...
A new theoretical model for piezoresistance in both n- and p-type polycrystalline silicon is describ...
The semiconductor physics appropriate to M.O.S.T.\u27s is presented here. Although piezoresistance t...
Piezoelectric materials guarantee enhanced linearity and lower actuation voltages compared to electr...
When computing the change in electrical resistivity of a piezoresistive cubic material embedded in a...
The room-temperature longitudinal piezoresistance of n-type and p-type crystalline silicon along sel...
AbstractUsing the fabrication techniques and materials of microelectronics as a basis, microelectrom...
The aim of this letter is to include the contribution of the optical phonon scattering mechanism in ...
The piezoresistive behavior of n + -diffusions in monocrystalline CMOS-processed silicon is calibr...
This paper constitutes the first part of a work devoted to applications of piezoresistance effects i...
This paper is devoted to the theoretical study of the influence of the temperature and of the doping...
Abstract- This contribution deals with possible reasons for the non-linear behaviour of piezoelectri...
We present a novel ab initio approach to piezoelectricity. The piezoelectric tensor is given by the ...
This thesis describes an investigation of the piezojunction effect in silicon. The aim of this inves...
This thesis describes an investigation of the piezojunction effect in silicon. The aim of this inves...
A full investigation into the piezoresistive effect in polycrystalline silicon is described. A theor...
A new theoretical model for piezoresistance in both n- and p-type polycrystalline silicon is describ...
The semiconductor physics appropriate to M.O.S.T.\u27s is presented here. Although piezoresistance t...
Piezoelectric materials guarantee enhanced linearity and lower actuation voltages compared to electr...
When computing the change in electrical resistivity of a piezoresistive cubic material embedded in a...
The room-temperature longitudinal piezoresistance of n-type and p-type crystalline silicon along sel...
AbstractUsing the fabrication techniques and materials of microelectronics as a basis, microelectrom...
The aim of this letter is to include the contribution of the optical phonon scattering mechanism in ...
The piezoresistive behavior of n + -diffusions in monocrystalline CMOS-processed silicon is calibr...