New volatile polyazolylborates of copper(I) for MOCVD

The volatility of new bis- and tetrakis-(pyrazolyl)borates of copper(I) with monodentate tertiary phosphines recently prepared has been prepared by the reaction between CuCl, phosphine and KBH2pz2 or KBpz4 in CH3CN (Hpz is a pyrazole-type ligand) has been studied. The IR data in gas in a vast temperature region confirm the stability of precursors in vapour, suggesting the molecular structure in vapour being similar to that determined previously by X-ray diffraction. The dependence of the volatility on the number of the pyrazolyl-moieties and nature of phosphine is discussed. Film growth rates obtained from MOCVD experiments, as well as XRD and SEM data for copper films deposited by using [CuH2B(pz)2(PMePh2)2] as precursor are reported