Laser capabilities of CuBr mixture excited by RF discharge

Our investigations demonstrated that utilizing copper bromide (CuBr) mixture as a source of Cu atoms in a RF-excited discharge can be a promising alternative to the Cu sputtered system, when the development of Cu ion gas laser is considered. Both spectroscopic and laser investigations showed that the threshold input power for lasing was reduced about 5 times using the CuBr-based system instead of the Cu-sputtered system. Pulsed and CW laser oscillation on Cu+ transitions in the near IR spectral region was obtained in RF-excited He-CuBr discharge operated at 13.56 MHz and 27.12 MHz. At input RF power of 800 W, a laser output power of 10 mW at the 780.8 nm Cu ion laser line was achieved. An increase of laser output power by a factor of two, as well as better Cu vapour axial distribution and better discharge stability, was attained when DC discharge was superimposed on the RF discharge. Laser gain on 11 UV Cu ion lines was observed in RF-excited Ne-CuBr discharge. basing on the obtained results, we consider the CuBr laser system excited by RF discharge capable of generating UV laser radiation at relatively low input power