An electron scattering model called IntriX associated to electron X-ray emission spectrometry (EXES) at high resolution is tested to characterize stratified samples. The ability of the model to simulate the X-ray intensity emitted by a surface layer and a buried layer in film/substrate systems is illustrated. The characterization of Al/Mn/Si multilayers by means of non destructive techniques (electron probe microanalysis (EPMA), Rutherford back scattering (RBS)) have been performed comparatively to the EXES measurements. The potentialities of the IntriX model combined to EXES to predict thicknesses is established by comparison with EPMA and RBS results
International audienceWe demonstrate quantitative, highly bulk-sensitive x-ray photoelectron emissio...
177 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1982.A computer-based Monte Carlo ...
A multilayer thin film structure of ten alternate Ta and Si layers with approximately 18 nm thicknes...
An electron scattering model called IntriX associated to electron X-ray emission spectrometry (EXES)...
Atomic layer deposition (ALD) of aluminum oxide thin films were applied on lateral high-aspect-ratio...
Periodic molybdenum silicon multilayers can be used as reflecting optical elements for many applicat...
Electron-induced X-ray emission spectroscopy (EXES) combined with a semi-empirical electron scatteri...
In the previous work we have developed a series of theoretical corrections for calculating the emitt...
The basic principles of X-ray microanalysis of thin surface films and stratified targets are summari...
International audienceXFILM is a computer program for determining the thickness and composition of t...
Quantification in surface analysis using Auger electron spectroscopy and X-ray photoelectron spectro...
The remarkable features of modern EPMA techniques are high sensitivity for very small coverages of ...
Electron density profiles across the 90-270 Å depth of Al/C multilayers on Ge substrates are determi...
When thin overlayers on a bulk material have to he analysed by EPMA (electron probe microanalysis) o...
A total-electron-yield technique is described in which near-surface extended x-ray-absorption fine-s...
International audienceWe demonstrate quantitative, highly bulk-sensitive x-ray photoelectron emissio...
177 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1982.A computer-based Monte Carlo ...
A multilayer thin film structure of ten alternate Ta and Si layers with approximately 18 nm thicknes...
An electron scattering model called IntriX associated to electron X-ray emission spectrometry (EXES)...
Atomic layer deposition (ALD) of aluminum oxide thin films were applied on lateral high-aspect-ratio...
Periodic molybdenum silicon multilayers can be used as reflecting optical elements for many applicat...
Electron-induced X-ray emission spectroscopy (EXES) combined with a semi-empirical electron scatteri...
In the previous work we have developed a series of theoretical corrections for calculating the emitt...
The basic principles of X-ray microanalysis of thin surface films and stratified targets are summari...
International audienceXFILM is a computer program for determining the thickness and composition of t...
Quantification in surface analysis using Auger electron spectroscopy and X-ray photoelectron spectro...
The remarkable features of modern EPMA techniques are high sensitivity for very small coverages of ...
Electron density profiles across the 90-270 Å depth of Al/C multilayers on Ge substrates are determi...
When thin overlayers on a bulk material have to he analysed by EPMA (electron probe microanalysis) o...
A total-electron-yield technique is described in which near-surface extended x-ray-absorption fine-s...
International audienceWe demonstrate quantitative, highly bulk-sensitive x-ray photoelectron emissio...
177 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1982.A computer-based Monte Carlo ...
A multilayer thin film structure of ten alternate Ta and Si layers with approximately 18 nm thicknes...