Amorphous hydrogenated carbon films (a-C:H) are very interesting materials for optical applications. They are transparent in the near IR part of the spectrum and its refractive index and absorption coefficient may be changed with the deposition parameters. In this paper we measure the optical constants of a-C:H films, deposited by plasma enhanced chemical vapor deposition as a function of the radio frequency power. The measurements were performed by the method of Abeles in lambda = 633 nm and by the approximation of Lambert-Beer in the transmission measurements using a spectrophotometer. Both methods do not require the use of thick films that are difficult to deposit due to the intrinsic stress of these films. The measurements were compared...
The technological importance of thin films of such materials as amorphous silicon and amorphous carb...
Hydrogenated amorphous silicon carbon alloys (a-Si1-xCx:H) with different carbon contents are deposi...
The infrared analysis of thin films on a thick substrate is discussed using the example of plasma-de...
Amorphous hydrogenated carbon films (a-C:H) are very interesting materials for optical applications....
Amorphous hydrogenated carbon (a-C:H) films were prepared by plasma enhanced chemical vapor depositi...
Methane (CH4) plasma was used to produce amorphous hydrogenated carbon (a-C:H) films by a single cap...
Optical and thermal properties of amorphous hydrogenated carbon (a-C:H) films deposited by plasma en...
Optical and thermal properties of amorphous hydrogenated carbon (a-C:H) films deposited by plasma en...
Optical and thermal properties of amorphous hydrogenated carbon (a-C:H) films deposited by plasma en...
In this thesis, the optical and luminescence properties of hydrogenated amorphous carbon(a - C:H) th...
Hydrogenated amorphous carbon (a-C:H) films were deposited on double-side polished germanium substra...
Amorphous hydrogenated carbon films have been deposited on crystalline silicon and on glass from an ...
Amorphous hydrogenated carbon films have been deposited on crystalline silicon and on glass from an ...
Two sets of hydrogenated amorphous silicon carbide (a-SiCx:H) thin films were grown on glass and c-S...
Nitrogen-doped hydrogenated amorphous carbon films have been deposited on silicon substrates by radi...
The technological importance of thin films of such materials as amorphous silicon and amorphous carb...
Hydrogenated amorphous silicon carbon alloys (a-Si1-xCx:H) with different carbon contents are deposi...
The infrared analysis of thin films on a thick substrate is discussed using the example of plasma-de...
Amorphous hydrogenated carbon films (a-C:H) are very interesting materials for optical applications....
Amorphous hydrogenated carbon (a-C:H) films were prepared by plasma enhanced chemical vapor depositi...
Methane (CH4) plasma was used to produce amorphous hydrogenated carbon (a-C:H) films by a single cap...
Optical and thermal properties of amorphous hydrogenated carbon (a-C:H) films deposited by plasma en...
Optical and thermal properties of amorphous hydrogenated carbon (a-C:H) films deposited by plasma en...
Optical and thermal properties of amorphous hydrogenated carbon (a-C:H) films deposited by plasma en...
In this thesis, the optical and luminescence properties of hydrogenated amorphous carbon(a - C:H) th...
Hydrogenated amorphous carbon (a-C:H) films were deposited on double-side polished germanium substra...
Amorphous hydrogenated carbon films have been deposited on crystalline silicon and on glass from an ...
Amorphous hydrogenated carbon films have been deposited on crystalline silicon and on glass from an ...
Two sets of hydrogenated amorphous silicon carbide (a-SiCx:H) thin films were grown on glass and c-S...
Nitrogen-doped hydrogenated amorphous carbon films have been deposited on silicon substrates by radi...
The technological importance of thin films of such materials as amorphous silicon and amorphous carb...
Hydrogenated amorphous silicon carbon alloys (a-Si1-xCx:H) with different carbon contents are deposi...
The infrared analysis of thin films on a thick substrate is discussed using the example of plasma-de...