We introduce a new model for kinetic roughening which exhibits a non-universal behavior for the roughness exponent, in agreement with many experimental findings. The model, inspired by the chemical etching processes, takes explicitly into account the effect of anisotropy, say the dependence of the growth rule on the local environment conditions. The interplay between anisotropy and non-universality is investigated as well as the relationship with the known universality classes
We propose a phenomenological equation to describe kinetic roughening of a growing surface in the pr...
We study the dynamics of an interface driven far from equilibrium in three dimensions. We first deri...
We present a method to describe the orientation dependence of the etch rate of silicon, or any other...
We introduce a new model for kinetic roughening which exhibits a non-universal behavior for the roug...
11 pages, 21 figures. submitted to PREInspired by the chemical etching processes, where experiments ...
23 pages, 1 figure.-- Published in: "Advances in Condensed Matter and Statistical Physics", New York...
International audienceIn this review, the authors are going to explore the intriguing aspectsof kine...
Kinetic roughening is not a phase transition and, as such, it lacks an exact definition. Many criter...
Recently, the kinetics of surface roughening has attracted a lot of attention in statistical physics...
We present a method to describe the orientation dependence of the etch rate in anisotropic etching s...
Recent experiments of wetting immiscible displacement in porous media and bacteria colony growth are...
We studied the interplay between kinetic roughening and phase ordering in a (1+1)-dimensional single...
We measure the roughness of fracture surfaces generated in uniaxial tension for model materials in ...
Kinetic roughening is not a phase transition and, as such, it lacks a sharp definition. Therefore, t...
We report an experimental assessment of surface kinetic roughening properties that are anisotropic i...
We propose a phenomenological equation to describe kinetic roughening of a growing surface in the pr...
We study the dynamics of an interface driven far from equilibrium in three dimensions. We first deri...
We present a method to describe the orientation dependence of the etch rate of silicon, or any other...
We introduce a new model for kinetic roughening which exhibits a non-universal behavior for the roug...
11 pages, 21 figures. submitted to PREInspired by the chemical etching processes, where experiments ...
23 pages, 1 figure.-- Published in: "Advances in Condensed Matter and Statistical Physics", New York...
International audienceIn this review, the authors are going to explore the intriguing aspectsof kine...
Kinetic roughening is not a phase transition and, as such, it lacks an exact definition. Many criter...
Recently, the kinetics of surface roughening has attracted a lot of attention in statistical physics...
We present a method to describe the orientation dependence of the etch rate in anisotropic etching s...
Recent experiments of wetting immiscible displacement in porous media and bacteria colony growth are...
We studied the interplay between kinetic roughening and phase ordering in a (1+1)-dimensional single...
We measure the roughness of fracture surfaces generated in uniaxial tension for model materials in ...
Kinetic roughening is not a phase transition and, as such, it lacks a sharp definition. Therefore, t...
We report an experimental assessment of surface kinetic roughening properties that are anisotropic i...
We propose a phenomenological equation to describe kinetic roughening of a growing surface in the pr...
We study the dynamics of an interface driven far from equilibrium in three dimensions. We first deri...
We present a method to describe the orientation dependence of the etch rate of silicon, or any other...