AES characterization and depth profiles measurements of AIN thin films on SiO2 substrates

Depth profiles measurements of the elements A1, Si, N and O were determined using Auger electron spectrometry during ion etching of an A1N C.V.D. thin film deposited on an amorphous silica substrate. The Auger spectra collected at various time intervals showed the presence of Al-O, Si-O and Si-N chemical bondings in the interphase A1N/SiO2. This result indicates that the growth of an A1N thin film on a silica substrate begins by a strong oxidation of aluminium which involves a partial nitridation of silicon