Theoretical aspect of film growth kinetics is discussed. Two approaches : microstuctural and transport phenomena are presented. An original model defined by the simplified laminar boundary layer theory is suggested. Using an example of experimental measurements, taken korn the literature, it is shown that it is not always easy to distinguish clearly between the various time laws to follow the real kinetics of CVD film growth
Based on corrected rate equations, the kinetics is revealed for the initial growth of thin films wit...
A phenomenological kinetic model is proposed for describing the production of a thin film containin...
Laser-assisted deposition: The discovery of chemical vapor deposition (CVD) conditions under which t...
The paper reports on three major aspects of CVD reactor simulation : 1) Modeling of transport phenom...
Because of the coupling of the temperature dependence of gas-phase reaction rate constants with the ...
The kinetic information on the surface reactions of a chemical vapor deposition (CVD) system is not ...
A kinetic model for description of the process of silicon film formation on silica by thermal decomp...
Because of the coupling of the temp. dependence of gas-phase reaction rate consts. with the steep te...
The deposition behavior of stearic acid evaporated in vacuum was observed using a quartz crystal mic...
Polyvinylchloride (PVC) films have been grown by isothermal immersion of rocksalt, copper and glass ...
During the last 10 years, remarkable achievements on the chemical vapor deposition (CVD) growth of 2...
Chemical vapor deposition (CVD) is gradually emphasized as one promising method for nanomaterial for...
Abstract. In this paper we present a kinetic model based on numerical simulations of a chemical vapo...
Solid state reaction as a new method of amorphous film fabrication was introduced by R. Schwartz and...
In this article some results regarding film growth considered as a stochastic process of dots are re...
Based on corrected rate equations, the kinetics is revealed for the initial growth of thin films wit...
A phenomenological kinetic model is proposed for describing the production of a thin film containin...
Laser-assisted deposition: The discovery of chemical vapor deposition (CVD) conditions under which t...
The paper reports on three major aspects of CVD reactor simulation : 1) Modeling of transport phenom...
Because of the coupling of the temperature dependence of gas-phase reaction rate constants with the ...
The kinetic information on the surface reactions of a chemical vapor deposition (CVD) system is not ...
A kinetic model for description of the process of silicon film formation on silica by thermal decomp...
Because of the coupling of the temp. dependence of gas-phase reaction rate consts. with the steep te...
The deposition behavior of stearic acid evaporated in vacuum was observed using a quartz crystal mic...
Polyvinylchloride (PVC) films have been grown by isothermal immersion of rocksalt, copper and glass ...
During the last 10 years, remarkable achievements on the chemical vapor deposition (CVD) growth of 2...
Chemical vapor deposition (CVD) is gradually emphasized as one promising method for nanomaterial for...
Abstract. In this paper we present a kinetic model based on numerical simulations of a chemical vapo...
Solid state reaction as a new method of amorphous film fabrication was introduced by R. Schwartz and...
In this article some results regarding film growth considered as a stochastic process of dots are re...
Based on corrected rate equations, the kinetics is revealed for the initial growth of thin films wit...
A phenomenological kinetic model is proposed for describing the production of a thin film containin...
Laser-assisted deposition: The discovery of chemical vapor deposition (CVD) conditions under which t...
DOI
Add to ORKG