In situ mass spetrometry during laser-induced chemical vapor deposition of silicon carbonitride

Mass spectrometry provides a means to study the kinetics of the decomposition of hexamethyldisilazane (HMDS) in detail. Towards this end, in situ mass spectrometry during Laser-Induced Chemical Vapor Deposition (LCVD) of silicon carbonitride is investigated. The reactant gases, HMDS, and ammonia, are heated by a continuous wave CO2-laser in a parallel configuration with the substrate. In this way, silicon carbonitride deposits are formed at low substrate temperatures (300 °C). Insight in the formation of reaction intermediairs during LCVD is obtained. The HMDS molecule splits at the Si-N bonding due to laser radiation