GaAs MESFET's with non-alloyed ohmic contacts have been achieved through a solid phase reaction of the Ge/Pd/GaAs(xtl) structure upon annealing at 325°C for 30 min. Different Au-based overlayers over Ge/Pd have been tested for device applications and compared with a conventional AuGeNi contact. The thermal stability of the contact resistivity has been evaluated through long-term storages at 300°C
A novel Ohmic contact system comprising of Pd/Sn metallizations has been developed for n-GaAs and sy...
A low resistance and shallow ohmic contact to n-GaAs is performed by using Ge/Pd/GaAs trilayer struc...
A low-temperature process for forming ohmic contacts to moderately doped GaAs has been optimized usi...
GaAs MESFET's with non-alloyed ohmic contacts have been achieved through a solid phase reaction of t...
Non-alloyed Pd/Ge ohmic contacts have been studied for applications to GaAs power metal-semiconducto...
Non alloyed Pd/Ge ohmic contacts have been studied for applications to GaAs power metal-semiconducto...
Pd/Ge/Ti/Au ohmic contacts have been studied for application to high-low doped GaAs metal-semiconduc...
Effects of an intermediate layer, such as Mo or Ti, have been studied for developing Pd-Ge-Au based ...
Thermally stable, low-resistance PdGe-based ohmic contacts to high-low doped n-GaAs have been develo...
[[abstract]]Pd/Ge ohmic contact to n-type GaAs is obtained by using the rapid thermal annealing (RTA...
[[abstract]]Pd/Ge contact to n-type GaAs is performed by using electron-beam evaporation and rapid t...
Recent advances in the technology and understanding of ohmic contacts to GaAs are presented. The pap...
GaAs metal-semiconductor field-effect transistors (MESFETs) have been fabricated utilizing thermally...
Good quality ohmic contacts to GaAs microwave devices are of vital importance for the efficient oper...
Abstract — The contribution deals with the performance of doping element/Pd/In contact structures o...
A novel Ohmic contact system comprising of Pd/Sn metallizations has been developed for n-GaAs and sy...
A low resistance and shallow ohmic contact to n-GaAs is performed by using Ge/Pd/GaAs trilayer struc...
A low-temperature process for forming ohmic contacts to moderately doped GaAs has been optimized usi...
GaAs MESFET's with non-alloyed ohmic contacts have been achieved through a solid phase reaction of t...
Non-alloyed Pd/Ge ohmic contacts have been studied for applications to GaAs power metal-semiconducto...
Non alloyed Pd/Ge ohmic contacts have been studied for applications to GaAs power metal-semiconducto...
Pd/Ge/Ti/Au ohmic contacts have been studied for application to high-low doped GaAs metal-semiconduc...
Effects of an intermediate layer, such as Mo or Ti, have been studied for developing Pd-Ge-Au based ...
Thermally stable, low-resistance PdGe-based ohmic contacts to high-low doped n-GaAs have been develo...
[[abstract]]Pd/Ge ohmic contact to n-type GaAs is obtained by using the rapid thermal annealing (RTA...
[[abstract]]Pd/Ge contact to n-type GaAs is performed by using electron-beam evaporation and rapid t...
Recent advances in the technology and understanding of ohmic contacts to GaAs are presented. The pap...
GaAs metal-semiconductor field-effect transistors (MESFETs) have been fabricated utilizing thermally...
Good quality ohmic contacts to GaAs microwave devices are of vital importance for the efficient oper...
Abstract — The contribution deals with the performance of doping element/Pd/In contact structures o...
A novel Ohmic contact system comprising of Pd/Sn metallizations has been developed for n-GaAs and sy...
A low resistance and shallow ohmic contact to n-GaAs is performed by using Ge/Pd/GaAs trilayer struc...
A low-temperature process for forming ohmic contacts to moderately doped GaAs has been optimized usi...