Kinetics of the drying process of an anti-adherent coating using Photothermal Radiometry and Micro-Raman

The kinetics of the drying process of a new anti-adherent (anti-graffiti) polymeric coating containing organic solvent was determined using Photothermal Radiometry (PTR) and Micro-Raman ($\mu$-R) Spectroscopy. PTR Spectroscopy was used to study, in real time, the kinetics of the drying process in samples protected with coatings with and without anti-adherent molecules. These were applied on a metal and silicon substrates. The PTR spectrum for coating without anti-adherent, shows a single relaxation time, while for coating containing anti-adherent shows two relaxation times corresponding to two different mechanisms: the solvent evaporation and the molecular re-arrangements of the two different molecular species present in the coating; the kinetic of the solvent evaporation is strongly dependent, as expected, on the solvent concentration