Focused ion beams, generated from high intensity liquid metal field emission ion sources, can be used both for machining and deposition. Their potential applications in microfabrication of semiconductor microcircuits range from mask and integrated circuit repair to lithography and direct write ion implantation doping
Nowadays, the systems that allow simultaneous employment of both focused electron and ion beams are ...
Focused ion beam (FIB) milling with a 10 nm resolution is used to directly write metallic metasurfac...
Focused ion beam (FIB) milling with a 10 nm resolution is used to directly write metallic metasurfac...
In order to rapidly prototype novel devices with nanoscale precision, new fabrication techniques whi...
Focused Ion Beams (FIB) are widely used in the semiconductor industry for milling, sputtering and im...
Focused Ion Beams (FIB) are widely used in the semiconductor industry for milling, sputtering and im...
Contains reports on three research projects.Joint Services Electronics Program (Contract DAAG29-83-K...
In this paper the possibilities of focused ion beam (FIB) applications in microsystem technology are...
Focused ion beam (FIB) micromachining has been used to produce inclined planes on semiconductor surf...
SIGLEAvailable from British Library Document Supply Centre- DSC:2265.63F(BR--100130)(microfiche) / B...
64 p.Over the years small structures, as microscale or even nanoscale. have gained great focus and p...
Fabrication of micro and nanoscale components are in high demand for various applications in divers...
64 p.Over the years small structures, as microscale or even nanoscale. have gained great focus and p...
[[abstract]]Submicrometer focused ion beams have been used both for the maskless ion implantation of...
Focused ion beams (FIB) with beam diameters of well below 100 nm found wide application in local mat...
Nowadays, the systems that allow simultaneous employment of both focused electron and ion beams are ...
Focused ion beam (FIB) milling with a 10 nm resolution is used to directly write metallic metasurfac...
Focused ion beam (FIB) milling with a 10 nm resolution is used to directly write metallic metasurfac...
In order to rapidly prototype novel devices with nanoscale precision, new fabrication techniques whi...
Focused Ion Beams (FIB) are widely used in the semiconductor industry for milling, sputtering and im...
Focused Ion Beams (FIB) are widely used in the semiconductor industry for milling, sputtering and im...
Contains reports on three research projects.Joint Services Electronics Program (Contract DAAG29-83-K...
In this paper the possibilities of focused ion beam (FIB) applications in microsystem technology are...
Focused ion beam (FIB) micromachining has been used to produce inclined planes on semiconductor surf...
SIGLEAvailable from British Library Document Supply Centre- DSC:2265.63F(BR--100130)(microfiche) / B...
64 p.Over the years small structures, as microscale or even nanoscale. have gained great focus and p...
Fabrication of micro and nanoscale components are in high demand for various applications in divers...
64 p.Over the years small structures, as microscale or even nanoscale. have gained great focus and p...
[[abstract]]Submicrometer focused ion beams have been used both for the maskless ion implantation of...
Focused ion beams (FIB) with beam diameters of well below 100 nm found wide application in local mat...
Nowadays, the systems that allow simultaneous employment of both focused electron and ion beams are ...
Focused ion beam (FIB) milling with a 10 nm resolution is used to directly write metallic metasurfac...
Focused ion beam (FIB) milling with a 10 nm resolution is used to directly write metallic metasurfac...
DOI
Add to ORKG