Pulse Electroplated Znco Alloys

The main purpose of the present paper was to study the morphology of ZnCo electrodeposits obtained by pulsed current plating. The plating bath was an acid bath containing chloride ions. The morphology was investigated by means of scanning electron microscopy and the quantity of zinc and cobalt in the deposits was analyzed by means of inductively coupled plasma spectroscopy. The experimental results show that pulsed current deposition favors the production of deposits with better adherence, homogeneity and having a lower porosity than those obtained with direct current. The morphology of the deposits depends on deposition parameters but not on the cobalt content of the deposit.The main purpose of the present paper was to study the morphology of ZnCo electrodeposits obtained by pulsed current plating. The plating bath was an acid bath containing chloride ions. The morphology was investigated by means of scanning electron microscopy and the quantity of zinc and cobalt in the deposits was analyzed by means of inductively coupled plasma spectroscopy. The experimental results show that pulsed current deposition favors the production of deposits with better adherence, homogeneity and having a lower porosity than those obtained with direct current The morphology of the deposits depends on deposition parameters but not on the cobalt content of the deposit.122169Townsend, H.E., (1991) Mater. Perform., 30, p. 60Natorski, T.J., (1992) Met. Finishing, 90, p. 15Sharples, T.E., (1988) Prod. Finishing (Cincinnati), 52, pp. 50-56Hsu, G.F., (1984) Plating Surf. Finishing, 71, pp. 52-55Bates, J.A., (1994) Plating Surf. Finishing, 81, pp. 36-40Shears, A.P., (1989) Trans. Inst. Met. Finishing, 67, pp. 67-69Sharples, T.E., (1990) Prod. Finishing, 54, pp. 38-44Higashi, K., Fukushima, H., Urakawa, T., (1981) J. Electrochem. Soc., 128, pp. 2081-2085Fratesi, R., Roventi, G., (1989) Mater. Chem. Phys., 23, pp. 529-540Fratesi, R., Roventi, G., Guliani, G., Tomachu, C.R., (1997) J. Appl. Electrochem., 27, pp. 1088-1094Karwas, C., Hepel, T., (1989) J. Electrochem. Soc., 136, pp. 1672-1678Yunus, M., Capel-Boute, C., Decroly, C., (1965) Electrochim. Acta, 10, pp. 885-900Vermeiren, P., Leysen, R., Vandenborre, H., (1985) Electrochim. Acta, 30, p. 1253Puippe, J.C., Leaman, F., (1986) Theory and Practice of Pulse Plating, , Orlando, FL: AESF Publication. 247 ppPuippe, J.C., Ibl, N., (1980) Plating Surf. Finishing, 67, pp. 68-72Ibl, N., Puippe, J.C., Angerer, H., (1978) Surf. Technol., 6, p. 28